Investigation of structural and reflective characteristics of short-period Mo/B₄C multilayer X-ray mirrors

Abstract

The results of a study of the structural and reflective characteristics of short-period multilayer X-ray mirrors based on Mo/B4C at wavelengths 1.54 Å, 9.89 Å and 17.59 Å are presented. The period of the samples varied in the range 8–35 Å. The average widths of the interfaces were ∼3.5 and 2.2 Å at one and the other boundaries, with a tendency for weak growth with any decrease in the period. The interlayer roughness was ∼1 Å. The research results indicate promising prospects for the use of multilayer Mo/B4C mirrors for synchrotron applications.

Effect of Annealing on Stress, Microstructure, and Interfaces of NiV/B4C Multilayers

“…Nanoscale multilayers are nanometer-thick films of different alternating materials stacked periodically on each other. The nanoscale multilayers have extensive applications in advanced imaging, spectroscopy, and monochromator systems in synchrotron radiation [1][2][3][4][5][6]. Short-period multilayer films are becoming increasingly required for monochromators of synchrotron radiation to meet the conditions of a large grazingincidence angle, higher working energy, and higher energy resolution.…”