Investigation of structural properties of ITO thin films deposited on different substrates

Purica, M.; Iacomi, Felicia; Baban, C.; Prepelita, Petronela; Apetroaei, N.; Mardare, Diana; Luca, D.

doi:10.1016/j.tsf.2007.03.117

Cited by 14 publications

(8 citation statements)

References 12 publications

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“…peak significantly increases with a simultaneous reduction in the peak half width indicating the growth of the ITO particles with the increase in the calcination temperature. The peaks observed in the XRD pattern of the calcined sample at 550 C match well with the cubic In 2 O 3 peaks reported in the Joint Committee for Powder Diffraction Standards (JCPDS 6-416) 6. The calculated lattice parameters for the cubic ITO phase are 10.13 Å when compared with the reported lattice parameters of undoped In 2 O 3 , which is 10.118 Å 7.…”

supporting

confidence: 80%

Nanocrystalline Indium Tin Oxide Fabricated via Sol–Gel Combustion for Electrochemical Luminescence Cells

Chaoumead

Kim²,

Park³

et al. 2012

j. nanosci. nanotech.

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Nanoporous indium tin oxide (ITO) was synthesized via a sol-gel combustion hybrid method using Ketjenblack as a fuel. The effects of the sol-gel combustion conditions on the structures and morphology of the ITO particles were studied. The size of the nanoporous powder was found to be 20-30 nm in diameter. The layer of the nanoporous ITO electrode (-10 microm thickness) with large surface area (-360 m2/g) was fabricated for an electrochemical luminescence (ECL) cell. At 4 V bias, the ECL efficiency of the cell consisting of the nanoporous ITO layer was approximately 1050 cd/m2, which is significantly higher than the cell using only the FTO electrode (450 cd/m2). The nanoporous ITO layer was effective in increasing the ECL intensities.

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supporting

confidence: 80%

Nanocrystalline Indium Tin Oxide Fabricated via Sol–Gel Combustion for Electrochemical Luminescence Cells

Chaoumead

Kim²,

Park³

et al. 2012

j. nanosci. nanotech.

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“…29 A (222) preferential orientation of ITO was seen in thin films grown by thermal evaporation in vacuum. 30 However, the texture of ITO films depends on the deposition method and processing conditions. For example, magnetron sputtered and electron beam deposited ITO films on amorphous and crystalline Si substrates are usually amorphous in the as deposited state with the substrate being at room temperature (RT) during deposition, whilst they crystallize upon heat treatment and/or upon deposition at higher substrate temperatures.…”

Section: B Ito-si Interfacesmentioning

confidence: 99%

Initial stages of ITO/Si interface formation: In situ x-ray photoelectron spectroscopy measurements upon magnetron sputtering and atomistic modelling using density functional theory

Løvvik

Diplas

Romanyuk

et al. 2014

Journal of Applied Physics

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Initial stages of indium tin oxide (ITO) growth on a polished Si substrate upon magnetron sputtering were studied experimentally using in-situ x-ray photoelectron spectroscopy measurements. The presence of pure indium and tin, as well as Si bonded to oxygen at the ITO/Si interface were observed. The experimental observations were compared with several atomistic models of ITO/Si interfaces. A periodic model of the ITO/Si interface was constructed, giving detailed information about the local environment at the interface. Molecular dynamics based on density functional theory was performed, showing how metal-oxygen bonds are broken on behalf of silicon-oxygen bonds. These theoretical results support and provide an explanation for the present as well as previous ex-situ and in-situ experimental observations pointing to the creation of metallic In and Sn along with the growth of SiO x at the ITO/Si interface. V C 2014 AIP Publishing LLC.

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“…Another notable feature was the evolution of the interface width as a function of deposition temperature, where valleys, mountains, and island clusters become larger as the temperature increases. The increment in the grain size may be responsible for decreased optical scattering [35], and consequently increased transmittance that is detected in the reported case for the ITO films prepared at the higher substrate temperature.…”

Section: Surface Topography Analysis By Atomic Force Microscopymentioning

confidence: 55%

Study of conducting ITO thin film deposition on flexible polyimide substrate using spray pyrolysis

et al. 2015

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Nanostructured indium tin oxide (ITO) thin films have been grown by chemical spray pyrolysis method on flexible polyimide (PI) polymeric substrates at various temperatures (400, 450 and 500°C) using solutions of indium and tin chlorides as precursors. The composition, microstructure, surface morphology, thermal, electrical, and optical characteristics have been analysed by FT-IR, UV-Vis, X-ray diffraction, SEM, EDAX, atomic force microscopy, electrical measurements, TGA, etc. X-ray diffraction measurements employing Cu-Ka radiation showed that the ITO films were polycrystalline with a cubic bixbyite structure. An increment in average grain size, electrical conductivity and optical transmittance was observed at higher substrate temperature. ITO-coated films maintained the mechanical properties and stability of the pristine PI films. The adhesion between surface ITO layers and PI matrix was found acceptable. Graphical Abstract

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Investigation of structural properties of ITO thin films deposited on different substrates

Cited by 14 publications

References 12 publications

Nanocrystalline Indium Tin Oxide Fabricated via Sol–Gel Combustion for Electrochemical Luminescence Cells

Nanocrystalline Indium Tin Oxide Fabricated via Sol–Gel Combustion for Electrochemical Luminescence Cells

Initial stages of ITO/Si interface formation: In situ x-ray photoelectron spectroscopy measurements upon magnetron sputtering and atomistic modelling using density functional theory

Study of conducting ITO thin film deposition on flexible polyimide substrate using spray pyrolysis

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