2006
DOI: 10.1016/j.tsf.2005.07.157
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Investigation of structural properties of poly-Si thin films obtained by aluminium induced crystallization in different atmospheres

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Cited by 11 publications
(6 citation statements)
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“…Simultaneously, the characteristic Raman peak of a-Si does not appear at 480 cm −1 , which also reveals the full crystallization of our poly-Si thin-film. The grain size is inversely proportional to the FWHM (full width at half maximum) of the Raman peak [11], so it can be deduced that the grain size of sample B is about 1-10 μm (FWHM = 7 cm −1 ), while the grain sizes of samples A and C have a relative size of about 20-30 μm (FWHM is 4.5 and 6 cm −1 , respectively). The Raman spectrum for sample C is comparable with that of sample A except for a bulge which appeared in the range from 510 to 516 cm −1 .…”
Section: Resultsmentioning
confidence: 99%
“…Simultaneously, the characteristic Raman peak of a-Si does not appear at 480 cm −1 , which also reveals the full crystallization of our poly-Si thin-film. The grain size is inversely proportional to the FWHM (full width at half maximum) of the Raman peak [11], so it can be deduced that the grain size of sample B is about 1-10 μm (FWHM = 7 cm −1 ), while the grain sizes of samples A and C have a relative size of about 20-30 μm (FWHM is 4.5 and 6 cm −1 , respectively). The Raman spectrum for sample C is comparable with that of sample A except for a bulge which appeared in the range from 510 to 516 cm −1 .…”
Section: Resultsmentioning
confidence: 99%
“…25 More recent reports have studied aluminum-induced crystallization in this materials system. 26,27 The mechanical properties of the metastable phase, formed during RT deposition with Si concentrations >45 at.%, were also examined recently. 28 The results of the Scherrer formula calculations, used to estimate the crystallite size from x-ray patterns, showed a decrease of the Al nanocrystallite size with increasing Si concentration.…”
Section: Resultsmentioning
confidence: 99%
“…Annealing in different atmospheres lead to different morphological structures due to different stages in the crystallization of the poly-Si crystallites, as reported in. 10 Generally, it is observed by optical reflection microscopy that the annealing in vacuum, vacuum + air and N 2 + H 2 leads to a decrease of the size of the a-Si areas, thus indicating the formation of more uniform poly-Si layer. CPM grey level height image and AFM image (Figs.…”
Section: Characterization Of the Poly-si Layersmentioning
confidence: 99%
“…The layers are then isothermally annealed in the following atmospheres: (i) air at 540 C for 3 h, (ii), vacuum (10 −3 -10 −4 Pa) at 550 C for 4 h, (iii) vacuum and subsequently in air (the same conditions as in (i) and (ii)), and (iv) N 2 + H 2 (forming gas) at 530 C for 4 h. The crystalline structure of the poly-Si films is improved when the annealing is performed in an atmosphere containing H 2 as shown in. 10 It is supposed that the presence of H 2 stimulates the crystalline grain growth during the process of AIC by increasing the diffusion rate of Al and Si. The poly-Si layers obtained are not chemically treated (etched) before HA deposition and therefore Al inclusions are present on the surfaces.…”
Section: Poly-si Preparationmentioning
confidence: 99%
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