2007
DOI: 10.1016/j.nimb.2006.10.064
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Investigation of the breakthrough point of ion track etching by capacitometry

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“…The archetypal latent tracks are vulnerable towards chemical etching, being predominantly amorphous in nature (Scheme ). Since the latent tracks are throughout the film, selective etching of the irradiated films generates nanochannels across the film thickness due to higher etching rate in latent track than the bulk …”
Section: Uses Of Latent Trackmentioning
confidence: 99%
“…The archetypal latent tracks are vulnerable towards chemical etching, being predominantly amorphous in nature (Scheme ). Since the latent tracks are throughout the film, selective etching of the irradiated films generates nanochannels across the film thickness due to higher etching rate in latent track than the bulk …”
Section: Uses Of Latent Trackmentioning
confidence: 99%