Investigation of the conditions for the formation of SiCN-based coatings in arc discharge with self-heated hollow cathode

Men’shakov, A. I.; Emlin, D. R.; Surkov, Yu. S.; Cholakh, S. O.

doi:10.1088/1742-6596/1134/1/012039

Cited by 3 publications

(4 citation statements)

References 11 publications

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“…An analysis of the coating composition by the FTIR method showed that Si−C and Si−N bonds are present in both coatings (Figure 3). In the IR spectra obtained, the intensity of the absorption peaks of hydrogen-containing bonds of the initial HDMS molecules is lower than in the coatings deposited in an arc discharge [9]. It may also confirm more intense decomposition of the precursor in beam plasma.…”

Section: Abstract Sicn Coating; Polymer Derived Ceramic; Low-energy Ementioning

confidence: 72%

Investigation of a New Method of the Organosilicon Compounds Activation by a Low-energy Electron Beam for SiCN-coatings Deposition

Men’shakov

Cholakh

2020

e-J. Surf. Sci. Nanotechnol.

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The article describes a new method of organosilicon compounds activation by low energy electron beam for SiCN coatings deposition. The composition of the beam plasma in a hexamethyldisilazane-containing gas medium was studied, and it was shown that the precursor molecules decomposition degree increases with the beam current and nonmonotonically depends on the electron beam energy. The application of a low-energy electron beam for the plasma-chemical vapor decomposition of hexamethyldisilazane and for samples heating up by electron beam to 600°C makes it possible to obtain SiCN-based coatings with a hardness up to 18 GPa and thickness ~1 μm for 1 h.One of the ecological, effective and productive modern methods for silicon carbonitride (SiCN) coatings production is a chemical vapor deposition in organosilicon compounds (OSC) vapors medium by its decomposition in plasma (PECVD) [1]. The main factor determining the unique characteristics of SiCN-coatings (such as high hardness, oxidation resistance, chemical inertness, etc.) are the conditions of its synthesis, so the possibility of a controlled change of various processing parameters is crucial for coatings with desired properties obtaining. Usually a radio frequency discharge is used for plasma activation of the precursor vapors [2]. It is important to control the precursor molecules decomposition degree in order to facilitate the formation of films containing both Si−C and Si−N bonds and, as a result, having high mechanical characteristics. However, when using gas discharges, in fact, the only controlled parameter is the discharge current (or power). An alternative way to generate plasma is to use low-energy electron beams [3]. The advantage of this method is that in the range of electron energies 100−200 eV, which is close to the maximum of electron impact ionization cross section of gas molecules and atoms, the frequency of plasma processes increases, resulting in the formation of ionized and excited particles. In addition, an important advantage of the sources used [4] is the independent control of the emission current and electron energy, pressure and gas medium composition over a wide range, which provides flexible control of the plasma parameters. This method was not previously used for the OSC decomposition.This approach was realized in an electrode system with a two-stage source of a wide (~100 cm 2 ) low-energy electron beam based on a self-heating hollow cathode discharge (SHHC), the design of which was described in detail in [5] (Figure 1). The beam current I b was varied up to 5 A by changing the discharge current in the first stage, electron beam energy varied in the range 50−500 eV. Hexamethyldisilazane [(CH 3 ) 3 Si] 2 NH (hereinafter HMDS) was taken as an OSC precursor. The precursor vapor flow was 2 g h −1 . Argon was used as the plasma-forming gas, which flow was kept constant (40 sccm), the pressure in the chamber was 0.2−0.3 Pa.The OSC molecules decomposition process is determined both by the binding energies between the atoms in the initial mo...

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Section: Abstract Sicn Coating; Polymer Derived Ceramic; Low-energy Ementioning

confidence: 72%

Investigation of a New Method of the Organosilicon Compounds Activation by a Low-energy Electron Beam for SiCN-coatings Deposition

Men’shakov

Cholakh

2020

e-J. Surf. Sci. Nanotechnol.

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“…The experimental setup is based on a gas-discharge system with an SHHC similar to [ 21 ]. In this work, the discharge is used not only to ionize the gas and decompose the precursor vapours, as in [ 20 ], but also to heat the crucible 1 and titanium evaporation using two independent anode sections. A tubular cathode 2 with a length of 70 mm and an internal diameter of 6 mm made of TiN powder by magnetic-impulse pressure was used [ 22 ].…”

Section: Methodsmentioning

confidence: 99%

“…This approach was used for producing binary a-Al 2 O 3 –coatings by Al evaporation in the oxygen-containing plasma [ 18 ] and TiN-coatings by Ti evaporation in nitrogen plasma [ 19 ]. The HCA was successfully applied to produce SiCN coatings and was efficient in the activation of hexamethyldisilazane ([(CH 3 ) 3 Si] 2 NH, HMDS) vapours [ 20 ].…”

Section: Introductionmentioning

confidence: 99%

Synthesis of Nanocomposite TiSiCN Coatings by Titanium Evaporation and Organosilicon Compound Activation in Hollow Cathode Arc Discharge

2022

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TiSiCN coatings have been obtained by anode evaporation of titanium and the decomposition of hexamethyldisilazane in an arc discharge, using a self-heated hollow cathode, at the pressure rate of 1 mTorr of the Ar+N2 gas mixture. The proposed method makes it possible to independently and widely change the amount of metal and precursor vapor flows, the pressure and composition of the vapor-gas mixture and the degree of ionic interaction on the surface of the growing coating within a single discharge system. The paper presents the method and the results of the effect of a current discharge (10–50 A), and the flux of precursor vapours (0–1 g/h), on deposition rates, compositions, and properties of TiSiCN coatings deposited by an advanced combined PVD+PECVD method. Dense homogeneous TiSiCN coatings up to 6 µm thick and up to 27.5 GPa in hardness were obtained at 7.5 µm/h. The composition of the obtained coatings has been studied by X-ray diffraction and X-ray photoelectron spectroscopy, and it has been shown that the presented methods can form nanocomposite coatings with nanocrystallites TiC, TiN, and TiCxN1−x 3–10 nm in the amorphous matrix based on SiCN.

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“…Как сообщают источники, добавка алюминия делает покрытия более устойчивыми к окислению при высоких температурах [4], а добавка углерода приводит к снижению коэффициента трения [5]. Благодаря сочетанию перечисленных свойств такие покрытия идеально подходят для защиты компонентов, подвергающихся окислению при высоких темпе-ратурах, от износа, в отличие от их предшественников -нитридных и карбонитридных покрытий [6]. Поэтому на сегодняшний день встала задача получения таких покрытий для защиты компонент газотурбинных двигателей и использование такого материла для высокотемпературных датчиков.…”

Section: Introductionunclassified

Исследование условий получения SiAlCN покрытий методом анодного испарения Al и разложения кремнийорганического прекурсора в разряде с самонакаливаемым полым катодом

Брюханова,

Меньшаков,

Скорынина

2023

MTD

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В работе исследован метод получения керамических PDC покрытий реактивным испарением алюминия в парах кремнийорганического прекурсора в разряде низкого давления с самонакаливаемым полым катодом (СНПК). Методом оптической эмиссионной спектроскопии исследован спектр плазмы разряда с СНПК в условиях испарения Al в среде Ar+N2+гексаметилдисилазан (ГМДС). Получены SiAlCN покрытия со скоростью осаждения до 11,3 мкм/ч. Полученные пленки имели плотную и однородную структуру и обладали твердостью до 25 ГПа и хорошей адгезией на образцах из нержавеющей стали. Результаты СЭМ и РФА показали, что в составе присутствуют все необходимые элементы, а покрытия являются рентгеноаморфными.

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Investigation of the conditions for the formation of SiCN-based coatings in arc discharge with self-heated hollow cathode

Cited by 3 publications

References 11 publications

Investigation of a New Method of the Organosilicon Compounds Activation by a Low-energy Electron Beam for SiCN-coatings Deposition

Investigation of a New Method of the Organosilicon Compounds Activation by a Low-energy Electron Beam for SiCN-coatings Deposition

Synthesis of Nanocomposite TiSiCN Coatings by Titanium Evaporation and Organosilicon Compound Activation in Hollow Cathode Arc Discharge

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