Temperature-dependent ac conductivity,
impedance spectroscopy,
and complex dielectric properties have been investigated on boron-doped
silicon oxide (SiO
X
:H) films grown by
radio frequency plasma-enhanced chemical vapor deposition at low temperature
(∼250 °C). The two-phase characteristics, e.g., silicon
nanocrystals (Si-ncs) embedded in amorphous oxide (a-SiO
X
:H) tissues, have been evaluated initially by structural
studies and subsequently via impedance spectroscopy. Impedance spectroscopy
also facilitates identifying the contribution of each individual phase
(nanocrystalline and amorphous) on the electronic properties of the
materials. The dependence of relaxation time on temperature obeys
Arrhenius behavior and also confirms a non-Debye type response under
the varying electric field. The negative temperature coefficient of
resistance behavior reveals the semiconducting nature of the materials.
A designed equivalent circuit model using parallel R∥CPE shows
comprehensive correlation among structural, microstructural, and charge
carrier characteristics. Frequency-dependent conductivity follows
Jonscher’s power law non-linear fitting and reveals a less
than unity magnitude of its exponent “n”.
The temperature dependence of ac conductance identifies a non-overlapping
small polaron tunneling mechanism prevailing in the B-doped SiO
X
:H network. The tunneling distance is higher
in B-doped nc-SiO
X
:H, and it reduces faster
at higher frequency in the B-doped a-SiO
X
:H matrix. The charge carrier density of states, N(E
F), is higher in nc-SiO
X
:H; however, the lower N(E
F) of B-doped a-SiO
X
:H enhances faster at elevated frequency. The frequency-dependent
electrical transport in the B-doped nanocrystalline/amorphous heterostructured
SiO
X
:H network has never been explored
before.