Investigation of the properties of nanostructured nickel oxide NiO thin films irradiated at different γ-doses

Chandoul, Faycal; Moussa, Hatem; Jouini, K.; Boukhachem, A.; Hosni, F.; Fayache, M. S.; Schneider, Raphaël

doi:10.1007/s10854-018-0299-z

Cited by 32 publications

(3 citation statements)

References 65 publications

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“…26 The additional peaks indicated by the "*" symbol correspond to FTO substrate. 27 To notice the influence of ion irradiation closely, several factors using XRD patterns were calculated. The average crystallite size, dislocation density and strain in pristine and Ag 9+ ion irradiated NiO thin films were estimated by considering the (111), (200), and (220) planes.…”

Section: Results and Discussion For Nio Thin Filmsmentioning

confidence: 99%

Engineering NiO Thin Film Properties using Ag⁹⁺ Ion Irradiation at Various Fluences

Karishma,

Tripathi,

Tripathi

et al. 2024

ECS J. Solid State Sci. Technol.

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The impact of the Ag9+ ion irradiation on the characteristics of nickel oxide (NiO) films with several ion fluences including 1x1012, 1x1013, and 1x1014 ions/cm2 has been studied. These films were deposited over fluorine-doped tin oxide substrate via spin coating technique. Then, structural, optical, vibrational, and electrical characteristics were investigated employing different techniques. The change in the structure due to Ag9+ ion has been studied by grazing-incidence X-ray diffraction. A slight improvement in crystalline nature of NiO thin film was observed at 1x1012 ions/cm2 ion fluence that can be understood via thermal spike model A decrement in value of transmission has been observed in the case of all thin films with ion fluence of Ag9+ ion. In addition, it was also observed that samples exposed to Ag9+ ions resulted in reduced intensity of the 1LO and 2LO modes in Raman spectrum. The reduced intensity of the Raman modes indicates the increment in the lattice defects. Further, atomic force microscopy analysis showed that increment in the ion fluences of incident Ag9+ on NiO thin films led to an enhancement in surface roughness. Moreover, the Hall effect measurements were also carried out to examine the electrical characteristics of NiO films.

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Section: Results and Discussion For Nio Thin Filmsmentioning

confidence: 99%

Engineering NiO Thin Film Properties using Ag⁹⁺ Ion Irradiation at Various Fluences

Karishma,

Tripathi,

Tripathi

et al. 2024

ECS J. Solid State Sci. Technol.

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“…12b). The Raman spectrum of sample 3 contains bands with maxima at 530 cm -1 and 1060 cm -1 , which correspond to the spectrum of nickel oxide [56] -Fig. 8 e. It follows from the STEM and Raman data that after annealing sample 1 in air at 1173 K, it is converted into nano dispersed nickel oxide with a particle size near 5÷8 nm.…”

Section: 22mentioning

confidence: 85%

Nanocomposite Obtained in the Plasma of a Pulsed High Voltage Discharge Using Nickel Electrodes and PTFE

et al. 2021

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In the plasma of pulsed high-voltage discharge, initiated between nickel electrodes in air, when the fluoroplastic is placed in the discharge gap, powder nanocomposite material has been synthesized. The nanocomposite contains NiF2 nanoparticles less than 5 nm in size, dispersed in a matrix consisting of carbon and fluorocarbon substances. The carbonaceous substance contains nanoscale disordered graphite-like regions. The fluorocarbon component of the composite contains fragments of PTFE molecules and fluorocarbon molecular fragments that differ in structure from PTFE molecule’s structure. After annealing the composite in air at 773 K, the initial nanocomposite is transformed into a nanocomposite containing nanosized PTFE and nanoparticles of NiF2 less than 5 nm in size, scattered in a matrix composed of nanographite and low-layer nanosized graphene, after aneling at 1173 K into a material containing NiO nanoparticles less than 10 nm in size. After annealing of the initial nanocomposite in argon atmosphere at 1073 K, the obtained nanocomposite contains Ni nanoparticles with sizes less than 5 nm and carbon and fluorocarbon components. The magnetic susceptibility of the unannealed nanocomposite is investigated. A transition to the antiferromagnetic phase at 73 K was detected. At T = 4K, exchange bias interaction of the AFM / FM type takes place in the composite. There is divergence of the FC and ZFC curves, which can be explained by the presence of a superparamagnetic phase or a spin glass phase in the sample. The field dependences of the magnetic susceptibility measured at T = 300 K show sharp changes that occur at certain values of the magnetic field. Elucidation of the nature of these changes requires additional research.

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“…26,35 The obtained Raman results is strongly agreed with earlier documented data. [36][37][38] The Raman measurements of the NiO/ZnO@30 min and NiO/ZnO@60 min are shown in Fig. 3b.…”

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confidence: 99%

Engineering of NiO/ZnO Core-Shell Nanostructure via Facile Chemical Processes for Environmental Application

Gomaa¹,

Sayed²,

Boshta³

2023

ECS J. Solid State Sci. Technol.

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NiO/ZnO core-shell nanoflake structures were successfully fabricated using a unique strategy consisting of a simple chemical bath deposition route followed by a metal-organic chemical vapor deposition technique with different growth times. The X-ray diffraction results combined with Raman measurements and X-ray photoelectron spectroscopy confirmed that the surface property and photocatalytic activity of NiO/ZnO core-shell nanostructures affected by varying the growth time of ZnO on the surface of NiO nanoflakes. The scanning electron microscopy images showed that the NiO/ZnO samples have a porous core-shell architecture with high surface area and abundant open sites, resulting in enhanced photocatalytic activity. The photocatalytic activity was tested for the prepared samples by measuring the degradation of crystal violet (CV) dye under ultraviolet irradiation. NiO/ZnO core-shell nanostructures deposited at 30 min exhibits higher photodegradation efficiency toward CV dye compared to NiO/ZnO core-shell deposited at 60 min and NiO nanoflakes standing alone. The enhanced photocatalytic activity is due to the formation of p–n heterojunction between ZnO and NiO with a high specific area and more active site of core-shell nanoflakes architecture. The obtained results in this research suggest a new strategy for the fabrication of highly efficient photocatalytic activity semiconducting metal oxide with core-shell.

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Investigation of the properties of nanostructured nickel oxide NiO thin films irradiated at different γ-doses

Cited by 32 publications

References 65 publications

Engineering NiO Thin Film Properties using Ag⁹⁺ Ion Irradiation at Various Fluences

Engineering NiO Thin Film Properties using Ag⁹⁺ Ion Irradiation at Various Fluences

Nanocomposite Obtained in the Plasma of a Pulsed High Voltage Discharge Using Nickel Electrodes and PTFE

Engineering of NiO/ZnO Core-Shell Nanostructure via Facile Chemical Processes for Environmental Application

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Investigation of the properties of nanostructured nickel oxide NiO thin films irradiated at different γ-doses

Cited by 32 publications

References 65 publications

Engineering NiO Thin Film Properties using Ag9+ Ion Irradiation at Various Fluences

Engineering NiO Thin Film Properties using Ag9+ Ion Irradiation at Various Fluences

Nanocomposite Obtained in the Plasma of a Pulsed High Voltage Discharge Using Nickel Electrodes and PTFE

Engineering of NiO/ZnO Core-Shell Nanostructure via Facile Chemical Processes for Environmental Application

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Engineering NiO Thin Film Properties using Ag⁹⁺ Ion Irradiation at Various Fluences

Engineering NiO Thin Film Properties using Ag⁹⁺ Ion Irradiation at Various Fluences