2020
DOI: 10.1088/1402-4896/ab49e8
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Investigation of thin-film p-BaSi2/n-CdS heterostructure towards semiconducting silicide based high efficiency solar cell

Abstract: In this article, semiconducting Barium Silicide (BaSi2) absorber based novel heterostructure thin-film solar cell (TFSC) has been studied in details. The solar cell has been numerically simulated and intensely analyzed by Solar cell Capacitance Simulator (SCAPS). Layer thickness was varied from 100 to 3000 nm for p+-BaSi2 absorber, 20 to 200 nm for both n-CdS buffer, and n+-SnO2:F window layers to optimize the device. Hitherwards, the impurities concentration for acceptor (NA) and donor (ND) ions was optimiz… Show more

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Cited by 73 publications
(50 citation statements)
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“…This can be attributed to the associated increase in the dark current with a thicker absorber, which reduces V OC in that cell. It has been reported that increasing the absorber thickness in a BaSi 2 /CdS/fluorine‐doped tin oxide solar cell causes V OC to decrease gradually . A very similar decreasing fashion is also observed for a‐Si:H solar cells .…”
Section: Resultssupporting
confidence: 62%
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“…This can be attributed to the associated increase in the dark current with a thicker absorber, which reduces V OC in that cell. It has been reported that increasing the absorber thickness in a BaSi 2 /CdS/fluorine‐doped tin oxide solar cell causes V OC to decrease gradually . A very similar decreasing fashion is also observed for a‐Si:H solar cells .…”
Section: Resultssupporting
confidence: 62%
“…More recently, it has been reported that the orthorhombic barium disilicide (β‐BaSi 2 ) can be applied as the best BSF layer for performance enhancement in CIGS‐based solar cells . The potential of BaSi 2 for solar cell applications has also been reported by many groups …”
Section: Introductionmentioning
confidence: 57%
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“…Therefore, a thin buffer layer is anticipated to achieve outstanding solar cell performances. The optimum thickness of the buffer layer is selected to be 60 nm for the following calculations in this simulation work, which is consistent with the buffer thickness employed in the previous works [37,39,40]. In this simulation, the effect of the CdS donor density ranging from 1 × 10 12 to 5 × 10 18 cm −3 with 2000-nm-thick absorber (acceptor density of 3.7 × 10 18 cm −3 ), 60-nm-CdS, and 50-nm-FTO (donor density of 1 × 10 18 cm −3 ) is analyzed.…”
Section: Effects Of Thickness and Donor Density Of Buffer Layer On Cell Performancesmentioning
confidence: 80%
“…The work function values of 4.28 eV [38] and 5.15 eV [38] are employed for the aluminum (Al) as front contact and nickel (Ni) as back contact, respectively. The thermal velocity of 1 × 10 7 cm/s for electrons and holes in each layer has been put during the simulation work [37,39]. The surface recombination velocities for both electrons and holes are set to 10 7 and 10 5 cm/s at front contact 10 5 and 10 7 cm/s at back contact, respectively [36,39].…”
Section: Device and Simulationmentioning
confidence: 99%