2020
DOI: 10.3390/app10062189
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Investigation of Ytterbium Incorporation in Lithium Niobate for Active Waveguide Devices

Abstract: In this work, we report on an investigation of the ytterbium diffusion characteristics in lithium niobate. Ytterbium-doped substrates were prepared by in-diffusion of thin metallic layers coated onto x- and z-cut congruent substrates at different temperatures. The ytterbium profiles were investigated in detail by means of secondary neutral mass spectroscopy, optical microscopy, and optical spectroscopy. Diffusion from an infinite source was used to determine the solubility limit of ytterbium in lithium niobate… Show more

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Cited by 5 publications
(10 citation statements)
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“…Before concluding this section, we note that for all the ion‐doping methods introduced in this section, the concentration limit only depends on the solid solubility ( C max ) of the RE element in LiNbO 3 . [ 77,96,97 ] For example, the solubility of Nd ( C max = 0.25 mol% at 1300 K) is experimentally determined to be only half that of Er ( C max = 0.5 mol% at 1300 K, corresponding to an ion concentration of 10 20 ion cm ‐3 ) in LiNbO 3 . [ 96 ] The solubility generally increases with the temperature, but it does not depend on the crystal cut.…”
Section: Preparation Of Re:lnoimentioning
confidence: 99%
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“…Before concluding this section, we note that for all the ion‐doping methods introduced in this section, the concentration limit only depends on the solid solubility ( C max ) of the RE element in LiNbO 3 . [ 77,96,97 ] For example, the solubility of Nd ( C max = 0.25 mol% at 1300 K) is experimentally determined to be only half that of Er ( C max = 0.5 mol% at 1300 K, corresponding to an ion concentration of 10 20 ion cm ‐3 ) in LiNbO 3 . [ 96 ] The solubility generally increases with the temperature, but it does not depend on the crystal cut.…”
Section: Preparation Of Re:lnoimentioning
confidence: 99%
“…Nevertheless, ion in‐diffusion is a fairly flexible approach for RE ion doping into photonic chips since it offers the full spectrum of spatially varying doping with required ions. [ 76–78 ] Thus, it is possible to have gradually varied ion concentrations, or even very different ion species, doped at desired substrate areas or within a particular photonic device, while the rest sections remain undoped. Despite a number of technological challenges still exist, thermal ion in‐diffusion is very promising for easy implementation of multiple RE ion doping of a monolithic photonic chip based on, e.g., thin‐film LNOI.…”
Section: Preparation Of Re:lnoimentioning
confidence: 99%
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