2012
DOI: 10.1016/j.apsusc.2012.09.104
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Investigation of ZnS–SiO2/Ag/ZnS–SiO2 as high stable transparent and conductive multilayer films

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Cited by 12 publications
(4 citation statements)
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“…Kermani et al [17], investigating the effect of annealing on the optical transmittance and resistance of ZnS/Ag/ZnS/Ag/ZnS multilayer films deposited on glass substrates by thermal evaporation, showed that the optimum thickness of ZnS and Ag was 30 and 12 nm, respectively. It was shown that the sheet resistance decreased initially with increasing the annealing temperature and increased as the temperature exceeded 300 C. The optimized samples showed a sheet resistance of 2.6 U/sq and the transmittance of 77.86% at 100 C. Long et al [18] investigated the effect of annealing temperatures on the optical and electrical properties of ZnSeSiO 2 /Ag/ZnSeSiO 2 multilayer films deposited on glass substrates by magnetron sputtering at room temperature. They reported that the optimized ZnSeSiO 2 /Ag/ZnSeSiO 2 (45 nm/11 nm/ 45 nm) film exhibited a sheet resistance of 9.7 U/sq and a optical transmittance of 88.4% after annealing at 200 C. For the sample annealed at 200 C, the average transmittance in the visible range (380e780 nm) was 84.1%.…”
Section: Introductionmentioning
confidence: 97%
“…Kermani et al [17], investigating the effect of annealing on the optical transmittance and resistance of ZnS/Ag/ZnS/Ag/ZnS multilayer films deposited on glass substrates by thermal evaporation, showed that the optimum thickness of ZnS and Ag was 30 and 12 nm, respectively. It was shown that the sheet resistance decreased initially with increasing the annealing temperature and increased as the temperature exceeded 300 C. The optimized samples showed a sheet resistance of 2.6 U/sq and the transmittance of 77.86% at 100 C. Long et al [18] investigated the effect of annealing temperatures on the optical and electrical properties of ZnSeSiO 2 /Ag/ZnSeSiO 2 multilayer films deposited on glass substrates by magnetron sputtering at room temperature. They reported that the optimized ZnSeSiO 2 /Ag/ZnSeSiO 2 (45 nm/11 nm/ 45 nm) film exhibited a sheet resistance of 9.7 U/sq and a optical transmittance of 88.4% after annealing at 200 C. For the sample annealed at 200 C, the average transmittance in the visible range (380e780 nm) was 84.1%.…”
Section: Introductionmentioning
confidence: 97%
“…In Fig. 3 , a difference within the Q is produced when the PCM length is “zero” (bare RR) before and after the annealing process and we attribute this to the optical (refractive index) and electronic (sheet resistance) properties change induced by the annealing process (270 C) to the sputtered ZnS - protective layer 53 , 54 . The experimental data shows a linear fit for the Q-factors of the amorphous and crystalline states as the phase transition increases linearly with the length of .…”
Section: Resultsmentioning
confidence: 91%
“…where ε s represents static permittivity, ε α is the infinite frequency permittivity, τ is the relaxation time, and σ is conductivity. To simplify the calculation, the visible-light absorption of ZnS-SiO 2 [46] in the air was considered negligible, that is the extinction coefficient (k) = 0. The calculated parameters are summarized in Tables 2 and 3.…”
Section: Modeling and Conditionmentioning
confidence: 99%