This work examines various materials for gate electrode for enhancing
the performance of M-Fe-MIMOS (Metal Ferroelectric Metal Insulator
Metal Oxide Semiconductor Field Effect Transistor (MOSFET)). The
device is analysed for different analog, electrical and RF parameters
with gate materials such as chromium, tungsten and palladium. The
gate stacked attached to MOSFET device consists ferroelectric layer
sandwiched with insulator for focusing on reliability and stability of
M-Fe-MIMOS. The palladium gate material for M-Fe-MIMOS(spacer)
shows better analog parameters such as improvement in leakage current
by 106 times that results 107 times higher switching ratio as compare to
chromium. Also with higher threshold voltage by 428% and lower subthreshold
swing by 340% as compare to chromium, M-Fe-MIMOS(spacer)
shows better immunity towards various noise distortions. The electrical
properties of the device are analysed in terms of electric field , electric
potential and energy band structure.All the analysed results indicate
that palladium as a gate material for the M-Fe-MIMOS shows most
improved electrical performance and can further be used for various
applications in nanoelectronic devices and integrated circuit (IC) design.