Investigation on properties of TiO2 thin films deposited at different oxygen pressures

Photocatalytic TiO2 films deposited by rf magnetron sputtering at different oxygen partial pressure

“…This is also similar to the result of Herman et al [15]. Investigations by Shen et al found an increase in oxygen partial pressure, gradual increase in optical transmittance, with the transmittance edge gradually shifting to short wavelength, and a corresponding refractive index decrease [16]. The contact angle of glass substrate was not decreased after the UV irradiation for 240 min, the glass substrate shows no hydrophilic characteristics.…”

Oxygen partial pressure and thermal annealing dependent properties of RF magnetron sputtered TiO2−x films

“…However, at higher pO 2 dense and smooth surfaces can be observed. This may be due to the low surface mobility of deposited particles at higher pO 2 [30]. These surface morphological features are in agreement with the XRD data which revealed the amorphous nature of the asdeposited TiO 2 À x films.…”

RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

“…The reason for obtaining anatase TiO 2 , as is the case for annealing amorphous TiO 2 [39][40][41], is that it requires less energy to form than the rutile phase. In the absence of substrate bias or heating, it is needed to adapt the other process parameters in order for the deposited particles to have enough energy to crystallize, otherwise the deposited thin film will be amorphous [42]. Each of the deposition parameters has an influence on the energy of the deposition particles and we have to take into consideration the geometry of the deposition chamber as well.…”