ICSE 2000. 2000 IEEE International Conference on Semiconductor Electronics. Proceedings (Cat. No.00EX425)
DOI: 10.1109/smelec.2000.932450
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Investigation on sidewall polymer contamination during metal etching in wafer fabrication

Hua Younan1,
E.C. Low2,
Ling-Zi An3
et al.
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