Investigation on the effect of ambient and beam profile in annealing and texturing of amorphous silicon thin films by pulsed Nd<sup>3+</sup>:YAG laser

Vidhya, Y. Esther Blesso; Vasa, Nilesh J.; Sriram, R.

doi:10.1117/12.2079750

Laser-Based Micro- And Nanoprocessing IX

2015

DOI: 10.1117/12.2079750

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Investigation on the effect of ambient and beam profile in annealing and texturing of amorphous silicon thin films by pulsed Nd³⁺:YAG laser

Y. Esther Blesso Vidhya

Nilesh J. Vasa

R. Sriram

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2016

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Investigation on the effect of ambient and beam profile in annealing and texturing of amorphous silicon thin films by pulsed Nd³⁺:YAG laser

Cited by 1 publication

References 10 publications

Underwater annealing and texturing for enhancing electrical characteristics of n-aSi/p-cSi using Nd 3 + : YAG laser beam-overlap technique with a wavelength of 532 nm

Underwater annealing and texturing for enhancing electrical characteristics of n-aSi/p-cSi using Nd 3 + : YAG laser beam-overlap technique with a wavelength of 532 nm

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Investigation on the effect of ambient and beam profile in annealing and texturing of amorphous silicon thin films by pulsed Nd3+:YAG laser

Cited by 1 publication

References 10 publications

Underwater annealing and texturing for enhancing electrical characteristics of n-aSi/p-cSi using Nd 3 + : YAG laser beam-overlap technique with a wavelength of 532 nm

Underwater annealing and texturing for enhancing electrical characteristics of n-aSi/p-cSi using Nd 3 + : YAG laser beam-overlap technique with a wavelength of 532 nm

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Investigation on the effect of ambient and beam profile in annealing and texturing of amorphous silicon thin films by pulsed Nd³⁺:YAG laser