1994
DOI: 10.1007/bf00921249
|View full text |Cite
|
Sign up to set email alerts
|

Investigations on the nucleation parameters of InGaAs grown on InP during LPE

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2009
2009
2017
2017

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(2 citation statements)
references
References 24 publications
0
2
0
Order By: Relevance
“…For SWIR (hyperspectral) imaging applications In 0.53 Ga 0.47 As, grown lattice matched on InP [4] is the preferred material scheme. After the deposition of an antireflective coating on the backside of the wafer, the detector material can be used 'as is", whereas for the Ge and InSb the substrate needs to be thinned down to make the detector sensitive.…”
Section: Detector Interfacingmentioning
confidence: 99%
“…For SWIR (hyperspectral) imaging applications In 0.53 Ga 0.47 As, grown lattice matched on InP [4] is the preferred material scheme. After the deposition of an antireflective coating on the backside of the wafer, the detector material can be used 'as is", whereas for the Ge and InSb the substrate needs to be thinned down to make the detector sensitive.…”
Section: Detector Interfacingmentioning
confidence: 99%
“…For SWIR imaging applications In0.53Ga0.47As, grown lattice matched on InP [6] is the preferred material scheme. After the deposition of an antireflective coating on the backside of the wafer, the detector material can be used 'as is", whereas for the Ge detectors the substrate needs to be thinned down to make the detector sensitive.…”
Section: A Fpa Architecturementioning
confidence: 99%