Abstract:We analyse the intense photoluminescence (PL) observed at energies from 600 to 1500 meV for many molecular beam epitaxy grown Si 1-x Ge x epitaxial layers. We show that the unexplained broad PL peak is due to self-assembled Ge nanocrystals (NCs) within the SiGe layers. The NCs are assumed lattice matched to the SiGe in the vertical, growth direction. As the Ge-fraction in the SiGe layer increases, the vertical strain in the NCs changes from compressive to tensile at x ~ 0.36, lowering the NC band gap (BG) belo… Show more
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