“…As for a physical interpretation, the conduction band of the AOS, e.g., IGZO, is composed of spherical orbitals (i.e., s orbitals) of metal cations; thus, the AOS is insensitive to the bonding angle disorder, whereas amorphous Silicon has strong bonding directivity due to the sp3 orbitals of its conduction band [18][19][20]. However, the AOS still has a bonding distance error in the amorphous phase, alluding to the existence of localized traps associated with band tail states, which can be estimated using extraction methods based on the current-voltage and capacitance-voltage characteristics [18,21]. In order to minimize these localized traps, process conditions can be optimized in terms of the AOS target compositions for the sputtering process, oxygen partial pressure, and annealing temperature [1,3,22].…”