2015
DOI: 10.1109/tasc.2014.2384994
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Ion-Beam-Assisted Deposition of Mo Thin Films for TES Applications

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Cited by 9 publications
(7 citation statements)
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“…The result of roughness R q (root mean surface squared roughness) is plotted vs. annealing temperature as shown in Figure 5. When the annealing temperature is below 300 • C, the R q is around 0.6 nm, which is similar or better than in previous work [7,12,15,20,30], as shown in Table 1. With good morphological property (lower roughness), the thin films present better performance in proximity effect and robust process compatibility in further TES fabrication with the multilayer readout wiring.…”
Section: Morphology Of Interface Compositionsupporting
confidence: 84%
See 1 more Smart Citation
“…The result of roughness R q (root mean surface squared roughness) is plotted vs. annealing temperature as shown in Figure 5. When the annealing temperature is below 300 • C, the R q is around 0.6 nm, which is similar or better than in previous work [7,12,15,20,30], as shown in Table 1. With good morphological property (lower roughness), the thin films present better performance in proximity effect and robust process compatibility in further TES fabrication with the multilayer readout wiring.…”
Section: Morphology Of Interface Compositionsupporting
confidence: 84%
“…The T c of pure Ti is from 360 to 500 mK [7][8][9][10][11] as the thicknesses changes. However, for a better ∆E, the T c should be ≈ 100 mK [12][13][14][15][16][17]. The tunable range of T c of a pure Ti film is limited.…”
Section: Introductionmentioning
confidence: 99%
“…We have previously reported on Mo films fabricated using ion-beam assisted e-beam evaporation 6 . A commercial end-Hall ion source is used in a cryo-pumped e-beam evaporator to deliver sufficiently high ion doses at low energy.…”
Section: Ion-beam Assisted Deposition Of Mo Filmsmentioning
confidence: 99%
“…Film stress showed a complex dependence on both ion energy and dose. Both tensile and compressive stresses can be produced, with higher ion energy and dose both leading to higher compressive stress 6 due to the atomic peening effect of ion beam 7 .…”
Section: Ion-beam Assisted Deposition Of Mo Filmsmentioning
confidence: 99%
“…Rather than build a hybrid chamber with multiple deposition methods, researchers have found solutions employing standard deposition systems. The limitations of evaporated Mo have been bypassed by either heating the sample substrate to > 500 • C [24] or incorporating an ion-beam to increase Mo atom energy [25]. Another solution has been to sputter a thin Au capping layer over a sputtered Mo film, breaking vacuum, and then evaporating high-quality Au for the remainder of the bilayer [26].…”
Section: Introductionmentioning
confidence: 99%