Ion beam assisted electron gun deposition of MgF₂ thin films

Abstract

SummaryA traditional method for increasing the density of the optical films, is heating the substrate. An alternative way to increase the density of the film, is bombardment of substrate by ions during film growth. This method is known as ion assisted deposition (IAD). In this paper, magnesium fluoride, MgF2, thin film has been produced on a glass substrate by ion assisted deposition method. The effects of ion energy have been studied on density and refractive index film. Reflection, transmission and scattering spectra of the samples were measured by a spectrophotometer. Moreover, Atomic force microscope (AFM) is prepared. Using these measurements, optical and physical properties of the films are analyzed. A sample of MgF2 film has been produced without ion bombardment so that one can compare the effect of ion bombardment.

Biaxial texture establishment and evolution in IBAD-MgO films under different ion-to-atom ratios

“…Over the past two decades, ion beam-assisted deposition (IBAD) has been successfully used to deposit biaxially aligned thin films on non-textured substrates, which plays a very vital role in various applications, such as semiconducting devices, high-temperature superconductor (HTS) tapes, etc. [1][2][3][4][5] The epitaxial growth of HTS tapes requires a textured buffer layer. Critical currents and critical current densities of HTS films are influenced by the performance of the textured buffer layer.…”