Ion-beam assisted sputtering of titanium nitride thin films

Abstract

Titanium nitride is a material of interest for many superconducting devices such as nanowire microwave resonators and photon detectors. Thus, controlling the growth of TiN thin films with desirable properties is of high importance. This work aims to explore effects in ion beam-assisted sputtering (IBAS), were an observed increase in nominal critical temperature and upper critical fields are in tandem with previous work on Niobium nitride (NbN). We grow thin films of titanium nitride by both, the conventional method of DC reactive magnetron sputtering and the IBAS method, to compare their superconducting critical temperatures $$T_{c}$$ T c as functions of thickness, sheet resistance, and nitrogen flow rate. We perform electrical and structural characterizations by electric transport and x-ray diffraction measurements. Compared to the conventional method of reactive sputtering, the IBAS technique has demonstrated a 10% increase in nominal critical temperature without noticeable variation in the lattice structure. Additionally, we explore the behavior of superconducting $$T_c$$ T c in ultra-thin films. Trends in films grown at high nitrogen concentrations follow predictions of mean-field theory in disordered films and show suppression of superconducting $$T_c$$ T c due to geometric effects, while nitride films grown at low nitrogen concentrations strongly deviate from the theoretical models.

Composite Materials with Nanoscale Multilayer Architecture Based on Cathodic-Arc Evaporated WN/NbN Coatings

“…Yet they are most commonly used to protect the surfaces of cutting tools and components that operate under friction conditions. Typically, these coatings are synthesized by various physical vapor deposition (PVD) techniques, such as magnetron sputtering (MS), cathodic-arc evaporation, and ion-beam-assisted deposition. , They are characterized by generating the vapor phase from the solid phase (cathode material) by physical methods, followed by its transfer to a low-pressure region and its condensation on the substrate. , PVD methods can produce a wide range of dense coatings, including metastable ones, due to the high ionization of the reactant species bombarding the substrate and the ability to use low deposition temperatures and various reactive gases. , TiN was the first nitride coating for various cutting and forming tools that was produced by vaporizing solid titanium in a nitrogen atmosphere . This was followed by a rapid progression in the development of new protective coatings, such as TiAIN, TiSiN, ZrN, CrN, CrAlN, AlCrSiN, and TiCrAISiN. − Despite the good functional properties of monolithic coatings, the multilayer design has proven its superiority.…”

“…Typically, these coatings are synthesized by various physical vapor deposition (PVD) techniques, such as magnetron sputtering (MS), cathodic-arc evaporation, and ion-beam-assisted deposition. 3 , 4 They are characterized by generating the vapor phase from the solid phase (cathode material) by physical methods, followed by its transfer to a low-pressure region and its condensation on the substrate. 5 , 6 PVD methods can produce a wide range of dense coatings, including metastable ones, due to the high ionization of the reactant species bombarding the substrate and the ability to use low deposition temperatures and various reactive gases.…”

Influence of topography on nano-mechanical properties of cylindrical magnetron sputtered TiN films

“…Due to these exceptional characteristics, TiN-based thin films are utilized in various applications such as wear-resistant coatings on cutting tools [1], microelectronics applications on semiconductors and interconnectors [2], corrosionresistant coating at acidic ambient [3], oxidationresistant coating for high-temperature applications [4]. TiN thin film can be synthesized through various techniques such as laser ablation [5], thermal evaporation, Chemical Vapor Deposition (CVD) [6], Cathodic Arc Evaporation (CAE) [7], ion beam-assisted Physical Vapor Deposition (IBPVD) [8] and sputtering. Compared to other techniques Magnetron Sputtering is a well appreciated technique, where highly energetic sputtered species participate in the deposition process under the vicinity of both electric and magnetic fields to deposit high-quality film [9].…”