2022
DOI: 10.1007/978-3-030-97277-6_9
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Ion Beam Deposition and Cleaning

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(2 citation statements)
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“…Such low energy (100 eV to a few keV) ions from an ion source can also be used for surface cleaning, polishing, erosion, and pattern. 28 The sputtering yields are also ion mass and energy dependent, where heavy ions have a higher sputtering yield under the same ion energy and the sputtering yields reach their maximum value at a few keV for light ions (e.g., H + /He + ) and around 100 keV for heavy ions (e.g., Xe + ). 29 A typical example of ion beam etching is focused ion beam manufacturing.…”
Section: Ion Beam Technologymentioning
confidence: 99%
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“…Such low energy (100 eV to a few keV) ions from an ion source can also be used for surface cleaning, polishing, erosion, and pattern. 28 The sputtering yields are also ion mass and energy dependent, where heavy ions have a higher sputtering yield under the same ion energy and the sputtering yields reach their maximum value at a few keV for light ions (e.g., H + /He + ) and around 100 keV for heavy ions (e.g., Xe + ). 29 A typical example of ion beam etching is focused ion beam manufacturing.…”
Section: Ion Beam Technologymentioning
confidence: 99%
“…From the technique point of view, the advantage of the IBD/IBAD technique is the controllability of the energies and influences of the ions incident on the growing surface. Such low energy (100 eV to a few keV) ions from an ion source can also be used for surface cleaning, polishing, erosion, and pattern . The sputtering yields are also ion mass and energy dependent, where heavy ions have a higher sputtering yield under the same ion energy and the sputtering yields reach their maximum value at a few keV for light ions (e.g., H + /He + ) and around 100 keV for heavy ions (e.g., Xe + ) …”
Section: Ion Beam Technologymentioning
confidence: 99%