2021
DOI: 10.1063/5.0061605
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Ion energy distribution function in very high frequency capacitive discharges excited by saw-tooth waveform

Abstract: Tailoring ion energy distribution function (IEDF) is vital for advanced plasma processing applications. Capacitively coupled plasma (CCP) discharges excited using non-sinusoidal waveform have shown its capability to control IEDF through generation of DC self-bias. In this paper, we performed a particle-in-cell simulation study to investigate the IEDF in a symmetric capacitive discharge excited by saw-tooth like current waveform at a very high frequency (VHF). At a constant driving frequency of 27.12 MHz, the s… Show more

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Cited by 19 publications
(14 citation statements)
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“…High-frequency sheath modulation and higher harmonics were observed in low-pressure CCP discharges excited by a current driven saw-tooth like waveform [57]. The study of IEDF by varying the current density amplitude of saw-tooth like waveform and driving frequency presented narrow IEDFs at lower current density amplitudes and higher driving frequencies [59].…”
Section: Introductionmentioning
confidence: 94%
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“…High-frequency sheath modulation and higher harmonics were observed in low-pressure CCP discharges excited by a current driven saw-tooth like waveform [57]. The study of IEDF by varying the current density amplitude of saw-tooth like waveform and driving frequency presented narrow IEDFs at lower current density amplitudes and higher driving frequencies [59].…”
Section: Introductionmentioning
confidence: 94%
“…In the past decade, the use of non-sinusoidal voltage waveforms has emerged as a promising way to control the asymmetry and ion flux/ion energies in CCP discharges [49][50][51][52][53][54][55][56][57][58][59]. Such waveforms are known as "Tailored Waveform" that are produced by incorporating higher harmonics in the sinusoidal waveform.…”
Section: Introductionmentioning
confidence: 99%
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“…The interaction between the plasma bulk and the sheath may produce a plasma series resonance which excites harmonics that not be driven by the power supply [17,18,19,20]. Also, substrates in the plasma are driven with tailored voltages to optimize the ion flux and ion energy to control plasma processing rates and process selection [21,22,23,24,25,26,27,28]. Tailoring the applied voltages may lead to a non-sinosoidal current.…”
Section: Introductionmentioning
confidence: 99%
“…In the last decade, CCP systems excited by non-sinusoidal waveforms [52][53][54][55][56][57][58][59][60][61][62][63][64][65] have shown a promising way to control the electron and ion heating asymmetry in the discharge that is useful in many plasma processing applications. These waveforms are known as "tailored waveform" produced by superimposing higher harmonics in the sinusoidal waveform.…”
Section: Introductionmentioning
confidence: 99%