Ion energy distribution functions in magnetized capacitively coupled RF discharges

Trieschmann, Jan; Shihab, Mohammed; Szeremley, Daniel; Elgendy, Abd Elfattah; Gallian, Sara; Eremin, Denis; Brinkmann, Ralf Peter; Mussenbrock, Thomas

doi:10.1109/plasma.2013.6634888

Cited by 1 publication

(3 citation statements)

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“…The MAE facilitates the control of charged species dynamics via restricting or enhancing the charged particle flux to surfaces within a source or reactor [47,71]. There are two general approaches to applying an MAE, (1) a homogeneous magnetisation of lighter particles (typically electrons) throughout a geometrically asymmetric source, i.e.…”

Section: Magnetic Asymmetry Effectmentioning

confidence: 99%

“…In effect, the 'inertia' of the sheath can be altered through controlling the degree to which electron are free to move perpendicular to the sheath. Of specific relevance to this work, Trieschmann et al [71], studied the application of a dual frequency driving voltage on a magnetised parallel plate discharge employing a 1D PIC model, and found the magnetised sheath dynamics to play a critical role in the resulting ion energy distribution.…”

Section: Magnetic Asymmetry Effectmentioning

confidence: 99%

“…As noted, many existing MAE studies have focused on geometries similar to magnetrons, employing a magnetic field normal to the powered electrode in a parallel plate RF-CCP discharge [44,45,47,48,71,72]. Such discharges are of significant interest to the sputtering community, but are topologically limited as all magnetic field lines terminate into the powered electrode surface.…”

Section: Magnetic Asymmetry Effectmentioning

confidence: 99%

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Magnetic enhancement of the electrical asymmetry effect in capacitively coupled plasmas

Doyle,

Boswell,

Charles

et al. 2024

J. Phys. D: Appl. Phys.

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The development of real-time control strategies for key discharge parameters, such as densities, fluxes, and energy distributions, is of fundamental interest to many plasma sources. Over the last decade, multi-harmonic ‘tailored’ voltage waveforms have been successfully employed to achieve enhanced control of key parameters in a wide range of radio-frequency (RF) plasma sources through application of the electrical asymmetry effect (EAE). More recently, the analogous magnetic asymmetry effect (MAE) has been numerically and experimentally demonstrated to achieve a notable degree of control in parallel plate RF plasma sources. The MAE is achieved via selectively magnetising the charged species adjacent to one electrode, altering the charge flux to the surface and enforcing a DC self-bias to maintain quasineutrality. This study addresses the degree of control achieved by the MAE in a non-planar geometry via 2D fluid/kinetic simulations of a magnetised RF capacitively coupled plasma (RF-CCP) source employing two different magnetic topologies. The simultaneous application of the EAE and MAE is then presented for the same geometry, demonstrating a degree of non-linear behaviour dependant upon the applied magnetic topology. Control of the DC self-bias voltage ηDC is demonstrated for a single 600 Vpp, 13.56 MHz discharge in both ‘convergent’ (maximum on-axis field strength) and ‘divergent’ (minimum on-axis field strength) magnetic topolgies. MAE induced modulations of ηDC = 0.13 Vpp and ηDC = 0.03 Vpp are achieved for each magnetic topology, respectively, for magnetic field strengths between 50 - 1000 G. Simultaneous application of an EAE and MAE is achieved through a multi-harmonic ‘peak’-type tailored voltage waveform employing varying harmonic phase offsets between 0◦ ≤ θ ≤ 360◦ . The degree to which the DC self-bias voltage is modulated by the applied EAE is mediated by the orientation and magnitude of the applied magnetic field. The EAE induced DC self-bias modulations exhibit non-linear behaviour in response to a superimposed MAE, such that the resulting DC self-bias differs from an additive combination of the two effects alone Simultaneous application of the electrical and magnetic asymmetry effects offers the possibility of further decoupling ion and electron dynamics in RF plasma sources, and represents an improvement over each approach in isolation.

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Section: Magnetic Asymmetry Effectmentioning

confidence: 99%

Section: Magnetic Asymmetry Effectmentioning

confidence: 99%