Ion energy distributions at a capacitively and directly coupled electrode immersed in a plasma generated by a remote source

Hayden, Chanel; Gahan, David; Hopkins, M. B.

doi:10.1088/0963-0252/18/2/025018

Cited by 38 publications

(42 citation statements)

References 38 publications

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“…The RFA consists of a series of 3 grids located behind a sampling aperture and terminated by a collector plate. 51,52 The transmission of each of the 3 grids is 33%. 53 The entrance orifice of the RFA sensor was placed in the magnetron's axis z.…”

Section: Measurements Of the Ion Distribution Functionmentioning

confidence: 99%

Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma

Straňák

Herrendorf

Drache

et al. 2012

Journal of Applied Physics

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Articles you may be interested inExperimental investigations of silicon tetrafluoride decomposition in ECR discharge plasma Rev. Sci. Instrum. 82, 063503 (2011); 10.1063/1.3599618 Design and characterization of 2.45 GHz electron cyclotron resonance plasma source with magnetron magnetic field configuration for high flux of hyperthermal neutral beam Rev. Sci. Instrum. 81, 083301 (2010);This paper reports on an investigation of the hybrid pulsed sputtering source based on the combination of electron cyclotron wave resonance (ECWR) inductively coupled plasma and high power impulse magnetron sputtering (HiPIMS) of a Ti target. The plasma source, operated in an Ar atmosphere at a very low pressure of 0.03 Pa, provides plasma where the major fraction of sputtered particles is ionized. It was found that ECWR assistance increases the electron temperature during the HiPIMS pulse. The discharge current and electron density can achieve their stable maximum 10 ls after the onset of the HiPIMS pulse. Further, a high concentration of double charged Ti þþ with energies of up to 160 eV was detected. All of these facts were verified experimentally by time-resolved emission spectroscopy, retarding field analyzer measurement, Langmuir probe, and energy-resolved mass spectrometry. V C 2012 American Institute of Physics.

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Section: Measurements Of the Ion Distribution Functionmentioning

confidence: 99%

Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma

Straňák

Herrendorf

Drache

et al. 2012

Journal of Applied Physics

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“…The RFEA is the SEMion TM made by Impedans, Ltd. 7, 8 The system is designed to work in a strong RF environment. The sensor is shown in Fig.…”

Section: B Ion Analyzermentioning

confidence: 99%

Ion ejection from a permanent-magnet mini-helicon thruster

Chen

2014

Physics of Plasmas

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A small helicon source, 5 cm in diameter and 5 cm long, using a permanent magnet (PM) to create the DC magnetic field B, is investigated for its possible use as an ion spacecraft thruster. Such ambipolar thrusters do not require a separate electron source for neutralization. The discharge is placed in the far-field of the annular PM, where B is fairly uniform. The plasma is ejected into a large chamber, where the ion energy distribution is measured with a retarding-field energy analyzer. The resulting specific impulse is lower than that of Hall thrusters but can easily be increased to relevant values by applying to the endplate of the discharge a small voltage relative to spacecraft ground. V C 2014 AIP Publishing LLC. [http://dx

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“…The IEDF is determined by differentiating the resultant current-voltage characteristic. The operation of this device has been discussed extensively in previous publications [20,[32][33]. Ions are sampled through an orifice which faces the plasma.…”

Section: Retarding Field Energy Analyzermentioning

confidence: 99%

Ion energy distribution measurements in rf and pulsed dc plasma discharges

Gahan

Hayden

Scullin

et al. 2012

Plasma Sources Sci. Technol.

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A commercial retarding field analyzer is used to measure the time-averaged ion energy distributions of impacting ions at the powered electrode in a 13.56 MHz driven, capacitively coupled, parallel plate discharge operated at low pressure. The study is carried out in argon discharges at 10 mTorr where the sheaths are assumed to be collisionless. The analyzer is mounted flush with the powered electrode surface where the impacting ion and electron energy distributions are measured for a range of discharge powers. A circuit model of the discharge, in combination with analytical solutions for the ion energy distribution in radio-frequency sheaths, is used to calculate other important plasma parameters from the measured energy distributions. Radio-frequency compensated Langmuir probe measurements provide a comparison with the retarding field analyzer data. The time-resolved capability of the retarding field analyzer is also demonstrated in a separate pulsed dc magnetron reactor. The analyzer is mounted on the floating substrate holder and ion energy distributions of the impinging ions on a growing film, with 100 ns time resolution, are measured through a pulse period of applied magnetron power, which are crucial for the control of the microstructure and properties of the deposited films.

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Ion energy distributions at a capacitively and directly coupled electrode immersed in a plasma generated by a remote source

Cited by 38 publications

References 38 publications

Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma

Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma

Ion ejection from a permanent-magnet mini-helicon thruster

Ion energy distribution measurements in rf and pulsed dc plasma discharges

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