Ion energy distributions in AZO magnetron sputtering from planar and rotatable magnetrons

Richter, Frank; Welzel, Thomas; Kleinhempel, Ronny; Dunger, Thoralf; Knoth, T.; Dimer, M.; Milde, F.

doi:10.1016/j.surfcoat.2009.09.034

Cited by 32 publications

(17 citation statements)

References 18 publications

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“…On the contrary, few works deal with negative ion surface-production in cesium-free plasmas 41,42,43,44,45,46,47,48,49,50,51,52,53,54,55,56,57,58,59,60,61,62,63,64,65,66,67,68 . Most of them are related to the industrial process of layer deposition by sputtering and concern mainly oxygen negative ions [44][45][46][47][48][49][50][51][52][53][54][55][56][57][58][59]. H-surface-production in Cs-free plasmas has been mainly studied in 59, 60, 61, 62 (carbon materials), 63 (stainless steel), and 64,65,66,67,68 (barium surfaces).…”

Section: A-introductionmentioning

confidence: 99%

Production of negative ions on graphite surface in H2/D2 plasmas: Experiments and srim calculations

et al. 2012

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In previous works, surface-produced negative-ion distribution-functions have been measured in H 2 and D 2 plasmas using graphite surfaces (HOPG). In the present paper we use the SRIM software to interpret the measured negative-ion distribution-functions. For this purpose the distribution-functions of backscattered and sputtered atoms arising due to the impact of hydrogen ions on a-CH and a-CD surfaces are calculated. The SRIM calculations confirm the experimental deduction that backscattering and sputtering are the mechanisms of the origin of the creation of negative ions at the surface. It is shown that the SRIM calculations compare well with the experiments regarding the maximum energy of the negative ions and reproduce the experimentally observed isotopic effect. A discrepancy between calculations and measurements is found concerning the yields for backscattering and sputtering. An explanation is proposed based on a study of the emitted-particle angulardistributions as calculated by SRIM. A-IntroductionThe ITER project and its successor DEMO (first nuclear-fusion based power plant prototype) aim at demonstrating power production by magnetic confinement nuclear fusion. Plasma start-up and continuous operation in the case of a tokamak reactor require very efficient heating and non-inductive current drive systems. Neutral beam injection (NBI) which uses high power beams of fast neutral atoms of hydrogen isotopes to heat the plasma is a promising candidate. In most existing NBI systems on contemporary fusion experiments a beam of positive ions is extracted from a conventional ion source, accelerated to energies of the order of 100 keV and neutralized via charge exchange in a background of neutral hydrogen. Due to the much larger physical dimensions the NBI systems for both ITER and DEMO require neutral beam energies in the 1 to 2 MeV range where the neutralization of positive ions becomes very inefficient and only the negative ions can be neutralized with sufficient yield. Hence the development of high current negative ion sources (50A D-beam for ITER) is crucial to the development of the ITER and DEMO NBI systems. The highcurrent-density negative-ion source for ITER 1 is currently the subject of intense research

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Section: A-introductionmentioning

confidence: 99%

Production of negative ions on graphite surface in H2/D2 plasmas: Experiments and srim calculations

et al. 2012

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“…The aluminum‐doped zinc (AZO) is due to lower cost of source materials much cheaper compared to ITO and can substitute it. Therefore, AZO thin films are very intensively investigated in many labs around the entire world 5–19. The AZO films can be easily deposited using a reactive DC or pulse magnetron sputtering from a Al:Zn alloy target in Ar + O 2 gas mixture.…”

Section: Introductionmentioning

confidence: 99%

Investigation of the Negative Ions in Ar/O₂ Plasma of Magnetron Sputtering Discharge with Al:Zn Target by Ion Mass Spectrometry

Pokorný

Mišina

Bulı́ř

et al. 2011

Plasma Processes & Polymers

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The magnetron sputtering discharge used to deposit aluminum‐doped zinc oxide was analyzed by energy‐resolved ion mass spectrometry. The flux of negative ions was measured at three radial positions in the plane of the substrate holder. The oxygen flow $\phi _{{\rm O}_{2} } $ was varied from 0 to 17 sccm to investigate the discharge in all operation modes, i.e., metallic, transition, and oxide mode of sputtering. The existence of negative ions was determined from the energy spectra. Main attention was devoted to the investigation of O−, ${\rm O}_{2}^{{-} } $, AlO−, ${\rm AlO}_{2}^{{-} } $, ZnO−, ${\rm ZnO}_{2}^{{-} } $, and ${\rm AlO}_{3}^{{-} } $ negative ions and correlations of their intensities in the energy spectrum with discharge parameters (cathode voltage, magnetron power, and gas pressure). It was found that (i) intensities of negative ions exhibit maxima in the vicinity of transition between the metallic and transition mode of sputtering and (ii) in the oxide mode intensities of these ions are saturated.

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“…From these results, we conclude that by utilizing off-axis sputtering, and thereby suppressing the flux of energetic particles, such as negative oxygen, 48,49 the density of lattice defects, including interstitial atoms and grain boundaries, can be reduced.…”

Section: With Buffer Layersmentioning

confidence: 87%

Off-axis sputter deposition of ZnO films on c-sapphire substrates by utilizing nitrogen-mediated crystallization method

et al. 2014

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Abstract. High-quality epitaxial ZnO films on c-plane sapphire substrates have been obtained by utilizing an offaxis sputtering configuration together with buffer layers prepared via nitrogen-mediated crystallization (NMC). The role of NMC buffer layers is to provide high density of nucleation site and, thus, to reduce the strain energy caused by the large lattice mismatch (18%) between ZnO and sapphire. The NMC buffer layers allow two-dimensional growth of subsequently grown ZnO films, being particularly enhanced by employing an off-axis sputtering configuration in which the substrate is positioned out of the high-energy particles, such as negative oxygen ions originating from the targets. As a result, ZnO films with smooth surfaces (root-mean-square roughness: 0.76 nm) and a high electron mobility of 88 cm 2 ∕V · s are fabricated. Photoluminescence spectra of the ZnO films show strong near-band-edge emission, and the intensity of the orange-red defect emission significantly decreases with increasing horizontal distance between the target and the substrate. From these results, we conclude that off-axis sputtering together with NMC buffer layers is a promising method for obtaining high-quality epitaxial ZnO films. © The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Ion energy distributions in AZO magnetron sputtering from planar and rotatable magnetrons

Cited by 32 publications

References 18 publications

Production of negative ions on graphite surface in H2/D2 plasmas: Experiments and srim calculations

Production of negative ions on graphite surface in H2/D2 plasmas: Experiments and srim calculations

Investigation of the Negative Ions in Ar/O₂ Plasma of Magnetron Sputtering Discharge with Al:Zn Target by Ion Mass Spectrometry

Off-axis sputter deposition of ZnO films on c-sapphire substrates by utilizing nitrogen-mediated crystallization method

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Ion energy distributions in AZO magnetron sputtering from planar and rotatable magnetrons

Cited by 32 publications

References 18 publications

Production of negative ions on graphite surface in H2/D2 plasmas: Experiments and srim calculations

Production of negative ions on graphite surface in H2/D2 plasmas: Experiments and srim calculations

Investigation of the Negative Ions in Ar/O2 Plasma of Magnetron Sputtering Discharge with Al:Zn Target by Ion Mass Spectrometry

Off-axis sputter deposition of ZnO films on c-sapphire substrates by utilizing nitrogen-mediated crystallization method

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Investigation of the Negative Ions in Ar/O₂ Plasma of Magnetron Sputtering Discharge with Al:Zn Target by Ion Mass Spectrometry