1990
DOI: 10.1016/0168-9002(90)90457-h
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Ion-implanted Si pn-junction detectors with ultrathin windows

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Cited by 32 publications
(4 citation statements)
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“…It does not contribute to the signal. In this PIN photodiode design, it is important to make the p-layer as shallow as possible [2] [3]. In order to achieve a shallow junction, the optimum conditions of ion implantation, such as the thickness of the SiO 2 oxide barrier, the tilting angle of the wafer with respect to the incident ion beam, and the annealing conditions, have been determined by using the results of simulation.…”
Section: B Design Of Pin Photodiodementioning
confidence: 99%
“…It does not contribute to the signal. In this PIN photodiode design, it is important to make the p-layer as shallow as possible [2] [3]. In order to achieve a shallow junction, the optimum conditions of ion implantation, such as the thickness of the SiO 2 oxide barrier, the tilting angle of the wafer with respect to the incident ion beam, and the annealing conditions, have been determined by using the results of simulation.…”
Section: B Design Of Pin Photodiodementioning
confidence: 99%
“…The actual dead layer thickness was determined by two different methods: Maisch et.al. [11] have measured the detector window as a function of the annealing state by using the technique of tilting the detector surface with respect to an incident a-particle beam. The resulting energy losses of a monoenergetic particle beam have been measured with standard high -resolution nuclear spectrometric techniques.…”
Section: Entrance Window and Quantum Detection Efficiencymentioning
confidence: 99%
“…The 12.5 keV Boron backside implantation used in our devices was analysed by the MPI for Nuclear Physics in Heidelberg [14]. The physical reason is that practically independant of the implantation parameters (within reasonable boundaries) the loss of signal charges is almost due to recombination in the undepleted region.…”
Section: The Radiation Entrance Windowmentioning
confidence: 99%