2000
DOI: 10.1109/27.902247
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Ion mean charge state in a biased vacuum arc plasma duct

Abstract: Vacuum arc or cathodic arc metal plasma sources are attractive and convenient for depositing high-quality thin metal films and metallurgical coatings. It is a common practice to use a curved magnetic filter duct to eliminate macroparticle contamination and to bias the duct wall with a positive voltage to enhance the throughput of the metal plasma. The metal plasma usually consists of several charge states and time-of-flight (TOF) experiments show that the mean charge state of the metal ions decreases with incr… Show more

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Cited by 6 publications
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