Ionization Phenomena in Gases

Abstract

The 250 visitors included many distinguished foreign guests from ten countries. Social activities were held over the weekend , beginning with a reception at Christ Church at which Lord Cherwell and Sir John Townsend were present. There were conducted tours of Oxford colleges and a garden party given by the British Council for overseas visitors. Later in the week ladies visited Blenheim Palace, a blanket mill at Witney and the theatre at Stratford-upon-Avon. Receptions were also given by the British Electricity Authority, and by the Mayor of Oxford. The conference was opened by Dr. A. von Engel, who surveyed the work in Great Britain. The delegates were also welcomed by Mr. T. C.

Fabrication of Nanocolumns for Liquid Chromatography

“…Support Architecture. Micromachining based on isotropic wet etching and anisotropic reactive ion etching does not allow fabrication of either the particulate or membrane support structures described above. This leads to the question of whether they are necessary; i.e., do spherical particles, or membranes, have some fundamental advantage as support matrixes.…”

“…This gave a high level of precision in controlling both the absolute dimensions of features and the relative width along the length of channels. The problem of producing vertical channel walls was addressed with anisotropic, deep reactive ion etching . Reactive ion etching would be expected to produce channel walls having an aspect ratio of 30/1 or greater .…”

Conversion of an atomic to a molecular argon ion and low pressure argon relaxation

“…We assume that the occurrence of double-Gaussian distribution is caused by the existence of two ions initiating breakdown in this time interval i.e., Ar + and Ar + 2 with different drift velocities. According to the experimental measurements, the Ar + 2 ions have higher drift velocities than Ar + ions, [33,34] therefore, the first distribution in the mixture most likely corresponds to Ar + 2 and the second one to Ar + ion. Based on this analysis and on the distribution ratio obtained by a fitting procedure, it can be assumed that the number density of Ar + 2 is greater than that of Ar + , which indicates that the change of dominant particle, caused by conversion, occurs at shorter relaxation time.…”

The Satisloh plasma polisher: plasma surface figuring ultra precision optics

“…The mean power absorbed by an electron from the field is given as follows: (13) Where e is the charge on the electron (C); m is the mass of the electron (kg); EMAX is the maximum field strength (N/C); v is the collision frequency between the electron and the gas atoms (Hz); and, w is the field frequency (Hz) [30]. Equation 13shows that there is a rather limited range of energy that can be absorbed by the ionised species within the plasma.…”