IP-Dip photoresist surfaces for photonic applications prepared by laser lithography and studied by AFM

Ďurišová, Jana; Pudiš, Dušan; Goraus, Matej; Gaso, Peter

doi:10.1016/j.apsusc.2018.06.230

Cited by 14 publications

(8 citation statements)

References 14 publications

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“…The objective of the microscope is immersed directly into the liquid photoresist. IP-Dip acts as a photosensitive material and also as an immersion medium, providing ideal focusing and a high resolution (down to approximately 200 nm) because of its refractive index matching with the focusing optics 32 . After the writing step, the sample is immersed in a bath of a developer (Propylene Glycol Monomethyl Ether Acetate, Sigma-Aldrich) and subsequently rinsed with isopropyl alcohol to remove the unpolymerized photoresist; it is then allowed to dry in air.…”

Section: Methodsmentioning

confidence: 99%

Development of spatially variant photonic crystals to control light in the near-infrared spectrum

Volk

Rai²,

Agha³

et al. 2022

Sci Rep

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Spatially Variant Photonic Crystals (SVPCs) have shown the ability to control the propagation and direction of light in the near-infrared spectrum. Using a novel approach for simplified modeling and fabrication techniques, we designed unique, spatially-varied, unit-cell structures to develop photonic crystals that maintain self-collimation and direction of light for desired beam tuning applications. The finite-difference time-domain technique is used to predict the self-collimation and beam-bending capabilities of our SVPCs. These SVPC designs and the simulation results are verified in laboratory testing. The experimental evidence shows that two-dimensional SVPCs can achieve self-collimation and direct light through sharp bends. The simplicity and quality of these designs show their potential for widespread implementation in modern devices. These SVPCs will serve as a unique solution to optical systems for optical computing, multiplexing, data transfer, and more.

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Section: Methodsmentioning

confidence: 99%

Development of spatially variant photonic crystals to control light in the near-infrared spectrum

Volk

Rai²,

Agha³

et al. 2022

Sci Rep

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“…Originally starting with a few polymer‐based resists, today there is a whole range of such resists designed for different length scales, writing speeds, optical, mechanical, or surface properties. [ 15–19 ] However, DLW‐suitable photoresists are not limited to traditional polymer‐based ones, but it is also possible to structure ceramics, [ 20,21 ] metals, [ 22,23 ] hydrogels, [ 24,25 ] glass, [ 26 ] and biomaterials. [ 27–32 ]…”

Section: Introductionmentioning

confidence: 99%

Utilizing the Sensitization Effect for Direct Laser Writing in a Novel Photoresist Based on the Chitin Monomer N‐acetyl‐D‐glucosamine

Meiers¹,

Rothammer

Maier

et al. 2023

Adv Eng Mater

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“…Nowadays, TPP has already become a functional tool in plenty of areas, such as micro/nanophotonics, microelectronics, bioengineering, microfluidics and other. Nanoscribe Professional GT system, in the Dip-in-liquid lithography (DiLL) configuration, allows to create three dimensional (3D) photonic structures on different surfaces with deep submicrometer resolution [10]. 3D PhC structures are more complicated to prepare and currently lithographic techniques based on polymer are mainly used.…”

Section: Introductionmentioning

confidence: 99%

3D photonic structures for optoelectronic applications

Suslik

Gaso

Jandura

et al. 2022

22nd Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics

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Photonics has become recently an intensively evolving area, where the possibilities of photonic structures or crystals (PhC) for integrated optoelectronics were found. An employment of three dimensional (3D) laser technology with combination of stable polymer resin enable printing of micro-optical and nano-optical components or other type diffractive structures for optoelectronic applications. In this paper, we demonstrate possibilities of 3D laser technology based on two photon polymerization for application in optoelectronics. We prepared two types of 3D polymer photonic structures, which was proposed for direct application on light emitting diode chip. We designed and fabricated Kagome and square lattice structures in 3D arrangement and we analyzed their properties in scanning electron microscope and by diffraction measurements.

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IP-Dip photoresist surfaces for photonic applications prepared by laser lithography and studied by AFM

Cited by 14 publications

References 14 publications

Development of spatially variant photonic crystals to control light in the near-infrared spectrum

Development of spatially variant photonic crystals to control light in the near-infrared spectrum

Utilizing the Sensitization Effect for Direct Laser Writing in a Novel Photoresist Based on the Chitin Monomer N‐acetyl‐D‐glucosamine

3D photonic structures for optoelectronic applications

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