IR laser-induced co-decomposition of trisilane and thiirane for deposition of polycarbosilthiane films

Pola, Josef; Urbanová, Markéta; Santos, M.; Díaz, Luis Eduardo; Šubrt, Ján

doi:10.1016/j.jaap.2007.11.008

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Plausible Reactions In the Gas Phase1

Introduction1

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2008

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“…H 2 SiS 2 ! H 2 S + SiS) [28], but the recorded FTIR spectra do not allow to distinct whether this gas-phase reactive species survives or is trapped with silylenes to yield silthiane polymer.…”

Section: Plausible Reactions In the Gas Phasementioning

confidence: 99%

“…Thus, the IR laser-induced co-decomposition of dimethyl selenide and trisilane [26] or dimethyl selenide and www.elsevier.com/locate/jaap 1,3-disilacyclobutane [27] yields gaseous SiSe and affords chemical vapor deposition of nanostructured H/Si/Se/C films. In addition, the IR laser co-decomposition of trisilane and thiirane allows gas-phase formation of SiS and chemical vapor deposition of polycarbosilthiane films [28].…”

Section: Introductionmentioning

confidence: 99%

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