1967
DOI: 10.1007/bf00523781
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IR spectroscopic study of the adsorption of ethylene and hydrogen on yttrium oxide

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“…It is well known that the resistance of WO 3 film as an n -type semiconductor material is increased in the presence of oxidizing gases and decreased when exposed to reducing gases [11,26]. Besides, yttrium oxide, as an n-type semiconductor material, may exhibit dehydration or dehydrogenation properties, depending on its pretreatment, in decomposition reactions of alcohols; it may also be a catalyst for the hydrogenation of olefins [27]. Therefore, the combination of these two oxides is supposed to produce an n + -type semiconductor material and the final product would be more sensitive to some gases, and the humidifying dependency of the mixed films should probably decrease due to the presence of yttria.…”
Section: Introductionmentioning
confidence: 99%
“…It is well known that the resistance of WO 3 film as an n -type semiconductor material is increased in the presence of oxidizing gases and decreased when exposed to reducing gases [11,26]. Besides, yttrium oxide, as an n-type semiconductor material, may exhibit dehydration or dehydrogenation properties, depending on its pretreatment, in decomposition reactions of alcohols; it may also be a catalyst for the hydrogenation of olefins [27]. Therefore, the combination of these two oxides is supposed to produce an n + -type semiconductor material and the final product would be more sensitive to some gases, and the humidifying dependency of the mixed films should probably decrease due to the presence of yttria.…”
Section: Introductionmentioning
confidence: 99%