ISO 11254: an international standard for the determination of the laser-induced damage threshold

Becker, Juergen; Bernhardt, Achim

doi:10.1117/12.180881

Cited by 22 publications

(10 citation statements)

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“…To achieve the precise measurement of the LIDT, many researchers have focused on the test method of the laser acting on medium 9 , the detection of damage morphology 10,11 , the calculation method of the LIDT 12 , and so on. However the uniformity of the irradiation source for damage threshold test has not been paid enough attention to.…”

Section: Introductionmentioning

confidence: 99%

Evaluation damage threshold of optical thin-film using an amplified spontaneous emission source

et al. 2014

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An accurate evaluation method with an amplified spontaneous emission (ASE) as the irradiation source has been developed for testing thin-film damage threshold. The partial coherence of the ASE source results in a very smooth beam profile in the near-field and a uniform intensity distribution of the focal spot in the far-field. ASE is generated by an Nd: glass rod amplifier in SG-II high power laser facility, with pulse duration of 9 ns and spectral width (FWHM) of 1 nm. The damage threshold of the TiO 2 high reflection film is 14.4J/cm 2 using ASE as the irradiation source, about twice of 7.4 J/cm 2 that tested by a laser source with the same pulse duration and central wavelength. The damage area induced by ASE is small with small-scale desquamation and a few pits, corresponding to the defect distribution of samples. Large area desquamation is observed in the area damaged by laser, as the main reason that the non-uniformity of the laser light. The ASE damage threshold leads to more accurate evaluations of the samples damage probability by reducing the influence of hot spots in the irradiation beam. Furthermore, the ASE source has a great potential in the detection of the defect distribution of the optical elements.

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Section: Introductionmentioning

confidence: 99%

Evaluation damage threshold of optical thin-film using an amplified spontaneous emission source

et al. 2014

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“…In order to balance the demand of damage resistance improvement with those negative effects mentioned above, different treatment parameters are investigated and several testing methods such as atomic force microscope (AFM) are used in this paper. Meanwhile, the damage resistance is characterized by the Son-1 method [9] which is one of the most important methods for laser-induced damage threshold (LIDT) testing at 355 nm. by galvanometers.…”

Section: Introductionmentioning

confidence: 99%

Full Aperture CO₂Laser Process to Improve Laser Damage Resistance of Fused Silica Optical Surface

Liao

Zhang

Xiaofen

et al. 2014

Advances in Condensed Matter Physics

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An improved method is presented to scan the full-aperture optical surface rapidly by using galvanometer steering mirrors. In contrast to the previous studies, the scanning velocity is faster by several orders of magnitude. The velocity is chosen to allow little thermodeposition thus providing small and uniform residual stress. An appropriate power density is set to obtain a lower processing temperature. The proper parameters can help to prevent optical surface from fracturing during operation at high laser flux. S-on-1 damage test results show that the damage threshold of scanned area is approximately 40% higher than that of untreated area.

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“…Recently, with advances made in the development of light sources, such as the trend towards lasers with higher power, shorter pulses, and shorter wavelengths, there has been a demand for the development of optical components having even higher damage resistance. Laser resistance is evaluated by an index called the laser-induced damage threshold (LIDT), which is measured by the 200-on-1 method according to ISO 11254-2 [9–10], for example. With this method, 200 locations on a sample surface are irradiated with single shots of pulsed laser light having different energy densities.…”

Section: Introductionmentioning

confidence: 99%

Observation and analysis of structural changes in fused silica by continuous irradiation with femtosecond laser light having an energy density below the laser-induced damage threshold

Nomura¹,

Kawazoe²,

Yatsui³

et al. 2014

Beilstein J. Nanotechnol.

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SummaryThe laser-induced damage threshold (LIDT) is widely used as an index for evaluating an optical component’s resistance to laser light. However, a degradation in the performance of an optical component is also caused by continuous irradiation with laser light having an energy density below the LIDT. Therefore, here we focused on the degradation in performance of an optical component caused by continuous irradiation with femtosecond laser light having a low energy density, i.e., laser-induced degradation. We performed an in situ observation and analysis of an increase in scattering light intensity in fused silica substrates. In experiments conducted using a pulsed laser with a wavelength of 800 nm, a pulse width of 160 fs and pulse repetition rate of 1 kHz, we found that the scattered light intensity increased starting from a specific accumulated fluence, namely, that the laser-induced degradation had a threshold. We evaluated the threshold fluence F t as 6.27 J/cm2 and 9.21 J/cm2 for the fused silica substrates with surface roughnesses of 0.20 nm and 0.13 nm in R a value, respectively, showing that the threshold decreased as the surface roughness increased. In addition, we found that the reflected light spectrum changed as degradation proceeded. We analyzed the details of the degradation by measuring instantaneous reflectance changes with a pump–probe method; we observed an increase in the generation probability of photogenerated carriers in a degraded silica substrate and a damaged silica substrate and observed a Raman signal originating from a specific molecular structure of silica. From these findings, we concluded that compositional changes in the molecular structure occurred during degradation due to femtosecond laser irradiation having an energy density below the LIDT.

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ISO 11254: an international standard for the determination of the laser-induced damage threshold

Cited by 22 publications

References 0 publications

Evaluation damage threshold of optical thin-film using an amplified spontaneous emission source

Evaluation damage threshold of optical thin-film using an amplified spontaneous emission source

Full Aperture CO₂Laser Process to Improve Laser Damage Resistance of Fused Silica Optical Surface

Observation and analysis of structural changes in fused silica by continuous irradiation with femtosecond laser light having an energy density below the laser-induced damage threshold

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ISO 11254: an international standard for the determination of the laser-induced damage threshold

Cited by 22 publications

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Evaluation damage threshold of optical thin-film using an amplified spontaneous emission source

Evaluation damage threshold of optical thin-film using an amplified spontaneous emission source

Full Aperture CO2Laser Process to Improve Laser Damage Resistance of Fused Silica Optical Surface

Observation and analysis of structural changes in fused silica by continuous irradiation with femtosecond laser light having an energy density below the laser-induced damage threshold

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Product

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Full Aperture CO₂Laser Process to Improve Laser Damage Resistance of Fused Silica Optical Surface