2013
DOI: 10.1016/j.mssp.2013.05.017
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Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions

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Cited by 30 publications
(17 citation statements)
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“…Chemical wet etching methods can be categorized into two types: anistropic and isotropic [36,37]. Both processes have different etching rates which depend on the material properties of the sample.…”
Section: Chemical Wet Etchingmentioning
confidence: 99%
See 2 more Smart Citations
“…Chemical wet etching methods can be categorized into two types: anistropic and isotropic [36,37]. Both processes have different etching rates which depend on the material properties of the sample.…”
Section: Chemical Wet Etchingmentioning
confidence: 99%
“…Recently, a research group applied isotropic wet etching technique to fabricate desired texture for light guidance application [36]. HNA based etchant solution is used to produce the surface structure of 300 μm deep channel with smooth wall.…”
Section: Chemical Wet Etchingmentioning
confidence: 99%
See 1 more Smart Citation
“…Chemical wet etching methods can be categorized into two types: anistropic and isotropic (Bauhuber et al, 2013;Mondiali et al, 2015). Both processes have different etching rates which depend on the material properties of the sample.…”
Section: Chemical Wet Etchingmentioning
confidence: 99%
“…(Lim, et al, 2005) Recently, a research group applied isotropic wet etching technique to fabricate desired texture for light guidance application (Bauhuber et al, 2013). HNA based etchant solution is used to produce the surface structure of 300 μm deep channel with smooth wall.…”
Section: Chemical Wet Etchingmentioning
confidence: 99%