2010 26th Annual IEEE Semiconductor Thermal Measurement and Management Symposium (SEMI-THERM) 2010
DOI: 10.1109/stherm.2010.5444299
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Issues in junction-to-case thermal characterization of power packages with large surface area

Abstract: There are several ways to define the junction-to-case thermal resistance; however, it is rather challenging to characterize the heat-flow in a package by a single number in an accurate and reproducible way. For many power package families such as TO-type packages the thermal transient testing and the so-called dual interface method can give reliable results.The diverging point of structure functions from dual thermal transients gives a good picture of the material interfaces in such structures. However, the lo… Show more

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Cited by 15 publications
(5 citation statements)
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“…The figure demonstrates that selecting a threshold between 0.05 J/K and 2 J/K, being of a ratio of 40, we can state that the R thJC junction to case thermal resistance is between 0.17 K/W and 0.19 K/W. In real cases with actual measured transients instead of simulated ones, this difference is less steep, as shown in Reference [23], but still gives a sharp detection of the R thJC quantity. In Figure 9, the structure functions generated from the Zth curves of Figure 7 are compared.…”
Section: Simulation Experiments On Static and Transient Metricsmentioning
confidence: 79%
“…The figure demonstrates that selecting a threshold between 0.05 J/K and 2 J/K, being of a ratio of 40, we can state that the R thJC junction to case thermal resistance is between 0.17 K/W and 0.19 K/W. In real cases with actual measured transients instead of simulated ones, this difference is less steep, as shown in Reference [23], but still gives a sharp detection of the R thJC quantity. In Figure 9, the structure functions generated from the Zth curves of Figure 7 are compared.…”
Section: Simulation Experiments On Static and Transient Metricsmentioning
confidence: 79%
“…The dissimilar characteristic displayed by these samples at Point A is likely because of the influence of annealing temperature on the properties of Cu-Al 2 O 3 thin films, as the rate of diffusion of Cu atoms into the Al 2 O 3 structure are varied. Thus, in the system-level analysis, the R th of the DUT varies because of the resultant properties of Cu-Al 2 O 3 thin films (Vass-Varnai et al , 2010).…”
Section: Resultsmentioning
confidence: 99%
“…In order to define the failure criteria for the degradation of the die attach material, thermal transient testing can be a suitable approach [5]. It requires a unit power step anyway, which can be generated by the same source that is used to create the power cycles.…”
Section: Reliability Testsmentioning
confidence: 99%