EUV photomasks define the lithographic layers of chips, which are binary structures of relatively low versatility in contrast to specimen in biology or materials science. This knowledge can be used in EUV photomask imaging and inspection methods to improve the speed or sensitivity. We present here a total variation-based phase retrieval algorithm similar to previous methods by Chang et al. and Enfedaque et al. for EUV mask imaging and metrology. Total variation (TV) regularization exploits the binary structure of the reticles, enforcing a sparse sample gradient. We compare the TV regularized algorithm, PtychoADMM, to a standard phase retrieval approach, the difference map (DM). For simulated data containing Poisson noise, we do not observe a benefit from using the TV based PtychoADMM algorithm. The reconstructed image quality is similar, while PtychoADMM being a computationally more demanding method. In future, we will investigate if TV can recover information where the standard DM approach fails, e.g. for relaxed measurement requirements like a lower signal to noise ratio or less probe overlap in the ptychography scan.