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Blum, J. M.; Tymiak, N. I.; Neuman, Anastasia; Wong, Z.; Rao, Narasimha D.; Girshick, Steven L.; Gerberich, William W; McMurry, Peter H.; Heberlein, J.

doi:10.1023/a:1010033413357

Cited by 19 publications

(12 citation statements)

References 16 publications

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“…Plasma-enhanced technologies have attracted considerable interest of scientists for the synthesis of different kinds of nanostructured materials (Blum 1999;Dai 2013;Martins 2001). As it has been demonstrated, plasma processes can be successfully used for fabrication by low-pressure low-temperature glow discharges of nanoparticles of various substances: metals (Alexandrov 2009;Kouprine 2006), silicon and aluminum nitrides (Bouchkour 2011;Viera 1998Viera , 1999, silicon and titanium oxides (Kouprine 2007).…”

Section: Introductionmentioning

confidence: 99%

Experimental study of fractal clusters formation from nanoparticles synthesized by atmospheric pressure plasma-enhanced chemical vapor deposition

2014

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This paper presents the experimental results from the fractal structures formation from nanoparticles of silicone dioxide deposited on the silicon substrate surface. Nanoparticles are synthesized by atmospheric pressure plasma-enhanced chemical vapor deposition with the use of capacitively coupled radio frequency (13.56 MHz) discharge sustained in helium atmosphere. Tetraethoxysilane is chosen as the test precursor. Correlation between the morphology of obtained deposits and the process parameters is found. The capability of nanoparticles movement along the deposit surface in local near-surface electric field is demonstrated. The empirical model that satisfactorily explained the mechanism of fractal clusters formation from nanoparticles on the substrate surface is developed. The model indicates that the dynamics of deposit morphology variations is determined by two competing processes: electrical charge transfer by nanoparticles to the deposit surface and electrical charge running off over the surface under conditions of changeable conductivity of the deposit surface.

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Section: Introductionmentioning

confidence: 99%

Experimental study of fractal clusters formation from nanoparticles synthesized by atmospheric pressure plasma-enhanced chemical vapor deposition

2014

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“…Deposition of nanoparticles onto substrates can significantly alter the physical properties of substrates. 24 Using this approach, nanoparticle beams of variable energies could potentially be used for such deposition/implantation applications. Because of the nature of the plasma source (low pressure, moderate plasma density) deposition and implantation can occur at very low pressures, minimizing background gas incorporation or scattering effects.…”

Section: Experimental Observationsmentioning

confidence: 99%

Observation of dust stream formation produced by low current, high voltage cathode spots

Foster

2004

Review of Scientific Instruments

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Macroparticle acceleration driven by low current, high voltage cathode spots has been investigated for potential applications ranging from micrometeoroid simulation to nanoparticle deposition/implantation. Acceleration by this process was observed to occur when nanometer and micrometer-sized particles were exposed to a high voltage pulse in the presence of a plasma discharge. The applied negative voltage pulse initiates the formation of multiple, high voltage, low current cathode spots which provide the mechanism of actual acceleration of the charged dust particles. Dust streams generated by this process were detected using laser scattering techniques. Cathode spot behavior was also documented. The particle impact craters observed at the surface of downstream witness badges were documented using scanning electron microscopy and light microscopy. The observed impacts suggest the presence of energetic macroparticles formed during this process.

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“…The cooling of the gas mixture through expansion results in nucleation and formation of particles with a narrow size distribution peaking at about 20 nm. The very high velocities of the particles (calculations indicate velocities of 2500 to 3000 m/s) allow inertial deposition of these particles on a substrate placed in front of the nozzle exit [18]. In a variation of this process, the particles are directed through a series of aerodynamic focusing lenses, resulting in features of 30 to 50 µm line width consisting of nanosize particles (see Fig.…”

confidence: 99%

New approaches in thermal plasma technology

Heberlein

2002

Pure and Applied Chemistry

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Thermal plasmas offer unique advantages for materials processing, such as high fluxes of heat and of reactant species. Recent developments have concentrated on improving control of these fluxes across the boundaries surrounding the thermal plasma. Secondary discharges (hybrid plasma generators) and pulse modulation of the plasma have been some of the approaches for this end. The use of such methods is described for selected applications. Plasma characterization through advanced models and diagnostics are concentrating on description of plasma instabilities and various nonequilibrium conditions. Understanding of these effects will allow their use for enhanced processing methods.

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Cited by 19 publications

References 16 publications

Experimental study of fractal clusters formation from nanoparticles synthesized by atmospheric pressure plasma-enhanced chemical vapor deposition

Experimental study of fractal clusters formation from nanoparticles synthesized by atmospheric pressure plasma-enhanced chemical vapor deposition

Observation of dust stream formation produced by low current, high voltage cathode spots

New approaches in thermal plasma technology

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