2019
DOI: 10.1039/c8fd00115d
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Key material parameters driving CBRAM device performances

Abstract: This study is focused on Conductive Bridging Random Access Memory (CBRAM) devices based on chalcogenide electrolyte and Cu-supply materials, and aims at identifying the key material parameters controlling memory properties.

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Cited by 15 publications
(9 citation statements)
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“…We note that similar considerations relating to material stability under repeated operation have also been the a b c e d subject of significant work in developing this class of materials for non-volatile memory applications with high cycling endurance. For instance, studies have shown that endurance can be improved via using alloy electrodes like Ag-Te [38], Ag-Cu [39], inserting Ag diffusion barrier layer [40], area scaling of the device switching region [41], using host materials with stronger chemical bonding among its components [42], nitridation [43]. We anticipate that resistance to such microstructural degradation for the case of the ARS may similarly be achieved by designing optimized electrode, switching structures, adjusting resistor area, new host matrix and electrode materials, and the introduction of solute additives that can retard diffusive processes that exacerbate microstructural fatigue.…”
Section: Discussionmentioning
confidence: 99%
“…We note that similar considerations relating to material stability under repeated operation have also been the a b c e d subject of significant work in developing this class of materials for non-volatile memory applications with high cycling endurance. For instance, studies have shown that endurance can be improved via using alloy electrodes like Ag-Te [38], Ag-Cu [39], inserting Ag diffusion barrier layer [40], area scaling of the device switching region [41], using host materials with stronger chemical bonding among its components [42], nitridation [43]. We anticipate that resistance to such microstructural degradation for the case of the ARS may similarly be achieved by designing optimized electrode, switching structures, adjusting resistor area, new host matrix and electrode materials, and the introduction of solute additives that can retard diffusive processes that exacerbate microstructural fatigue.…”
Section: Discussionmentioning
confidence: 99%
“…In CBRAMs [44,45,46], a conductive filament (CF) is created (and dissolved) in a solid electrolyte by means of redox reactions. By applying a positive voltage to the “active” electrode (the anode), it releases metallic cations into the electrolyte that migrate towards the “inert” electrode (the cathode) pushed by the electric field.…”
Section: Methodsmentioning
confidence: 99%
“…The ultralow HRS current stems from the device design, which keeps the area of the active surface minimal. The switching voltage to a low-resistance state (LRS) of the TS device is V th ≈ 0.4 V. Note, V th can be tuned through the fabrication method from ∼0.15 to 1 V [14], [15], which allows for flexible matching to the range of valid threshold voltages (V th ) of each circuit, which in turn depends on the V DD . At the switching point, the current abruptly increases by a factor of 10 8 .…”
Section: Low-leakage Threshold Switchmentioning
confidence: 99%