2021
DOI: 10.1016/j.watres.2021.117046
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Key structural features that determine the selectivity of UV/acetylacetone for the degradation of aromatic pollutants when compared to UV/H2O2

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Cited by 41 publications
(18 citation statements)
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“…张国洋等: 双酮基光化学高级氧化/还原技术:分子机制解析及研究进展 图 6 (a) 高级氧化/还原技术体系中相关的自由基以及氧化剂的还原电位天梯图(E 0 vs. NHE) [57] ; (b) UV/双酮体系中有机自由基(直接 裂解以及氧合、水合后的自由基)的理论氧化还原电位(E 0 vs. NHE), 计算方法引自文献 [58] (网络版彩图) Figure 6 (a) Redox ladder of redox couples (E 0 vs. NHE) in the advanced oxidation/reduction technology (AOTs) [57] ; (b) One electron standard reduction potential (E 0 vs. NHE) of the organic free radicals in UV/diketone system. The calculation method was cited from the literature [58] (color online) 值得一提的是, 虽然传统氧化剂(O3、H2O2、Cl2 [61] .…”
Section: 在紫外光辐照下 Bdmentioning
confidence: 99%
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“…张国洋等: 双酮基光化学高级氧化/还原技术:分子机制解析及研究进展 图 6 (a) 高级氧化/还原技术体系中相关的自由基以及氧化剂的还原电位天梯图(E 0 vs. NHE) [57] ; (b) UV/双酮体系中有机自由基(直接 裂解以及氧合、水合后的自由基)的理论氧化还原电位(E 0 vs. NHE), 计算方法引自文献 [58] (网络版彩图) Figure 6 (a) Redox ladder of redox couples (E 0 vs. NHE) in the advanced oxidation/reduction technology (AOTs) [57] ; (b) One electron standard reduction potential (E 0 vs. NHE) of the organic free radicals in UV/diketone system. The calculation method was cited from the literature [58] (color online) 值得一提的是, 虽然传统氧化剂(O3、H2O2、Cl2 [61] .…”
Section: 在紫外光辐照下 Bdmentioning
confidence: 99%
“…曝 N2、N2O 或者将溶剂更换为重水对 UV/AA 法脱色效率的影响也很有限, 说明光致产生的 活性氧物种并不是 UV/AA 法的主要作用物种 [15,22] . 通 过量化计算发现, AA 的三重激发态 3 (AA) * 能够与偶氮、 三芳甲烷类染料进行自发的电子或能量转移 [22,58] . [20] (网络版彩图) Figure 10 Two mechanisms of the Cr(VI) reduction with UV/AA process: carbon-center radical pathway and complexation pathway [20] (Reproduced with permission.…”
Section: 在紫外光辐照下 Bdunclassified
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