Kinetic model of XeF laser

Abstract

Introduction.The exciplex lasers are now the most powerful among plasma lasers from visible to VIJV range [1-41. The lasers on the exciplex molecules KrF (249 nm), ArF(193 run), XeC1(3O8 nm), XeF (351, 353nm) are most advanced. The operating transition of this lasers is B-+X. The lower (ground) operating term X is the repulsive or weak-coupled one. The highest efficiency (10%) have KrF-laser and, may be [71, ArF-laser. The XeFlaser efficiency is not so high (3%), but this laser is of interest because it has the lowest threshold of pumping among exciplexiasers. Therefore, the opportunity ofnuclear pumping of XeF-laser is under discussion [5].The X term have in XeF molecule a rather deep well. This peculiarity leads to more strong gas temperature dependence and to not high efficiency. It must be mentioned that in the models of the XeF-laser developed up today, the temperature dependence of plasma-chemical reaction rates and its influence on laser output is not considered in details. Besides, the only effective operating transition, not the lasing on two separate transitions (2 =351 and 353 urn) was considered in the most papers.

Optimization of gas mixtures of multiband excilamps

“…It should be noted that expression (12) is also suitable for estimating the ratio of partial pressures of halogen carriers in the case of an excilamp based on an inert gas mixture with three or more halogen carriers. In this case, the final expressions (11) and (12) do not undergo any changes. It is easy to verify this if in the expressions involving the function F we single out the channel for the escape of excited xenon atoms to form third-class exciplex molecules, i.e., represent F as k[X 2 ] + F, where [X 2 ] is the third-class halogen carrier concentration and k is the rate constant for the formation of third-class exciplex molecules due to the harpoon reaction with X 2 .…”