Kinetic study of the reaction of the acetyl radical, CH3CO, with O3 using cavity ring-down spectroscopy

Gierczak, Tomasz; Rajakumar, B.; Flad, Jonathan E.; Burkholder, James B.

doi:10.1016/j.cplett.2009.11.037

Cited by 3 publications

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References 22 publications

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“…11 Experiments were performed using a crossed pulsed laser photolysis-cavity ring-down setup, Figure 1, as used previously in this laboratory. [12][13][14][15] The photolysis laser beam passed the length of the reactor at a right angle to the CRD optical cavity. The temperature-regulated reactor was triple jacketed with either 248 nm AR coated or UV grade quartz windows.…”

Section: Methodsmentioning

confidence: 99%

ClO Radical Yields in the Reaction of O(¹D) with Cl₂, HCl, Chloromethanes, and Chlorofluoromethanes

2010

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Absolute ClO radical product yields in the gas-phase reactions of O((1)D) with Cl(2), HCl, CCl(4), CHCl(3), CH(2)Cl(2), CH(3)Cl, CFCl(3), CF(2)Cl(2), CF(3)Cl, CHFCl(2), and CHF(2)Cl are reported. Product yields were measured using pulsed-laser photolysis of O(3) to produce O((1)D) in the presence of excess reactant combined with dual wavelength differential cavity ring-down spectroscopic detection of the ClO radical. ClO radical absorption cross sections for the A(2)Π(v = 10) ← X(2)Π(v = 0) transition band head near 280 nm were determined between 200 and 296 K as part of this work. The ClO product yields obtained at room temperature were Cl(2) (0.77 ± 0.10), HCl (0.20 ± 0.04), CCl(4) (0.79 ± 0.04), CHCl(3) (0.77 ± 0.04), CH(2)Cl(2) (0.73 ± 0.04), CH(3)Cl (0.46 ± 0.06), CFCl(3) (0.79 ± 0.04), CF(2)Cl(2) (0.76 ± 0.06), CF(3)Cl (0.82 ± 0.06), CHFCl(2) (0.73 ± 0.05), and CHF(2)Cl (0.56 ± 0.03), where the quoted error limits are 2σ of the measurement precision. ClO product yields in the O((1)D) + Cl(2) and CFCl(3) reactions were found to be independent of temperature between 200 and 296 K, within the precision of the measurements. The absolute ClO yields obtained in this study are compared with previously reported values determined using relative and indirect methods.

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Section: Methodsmentioning

confidence: 99%

ClO Radical Yields in the Reaction of O(¹D) with Cl₂, HCl, Chloromethanes, and Chlorofluoromethanes

2010

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Rate coefficients and ClO radical yields in the reaction of O(¹D) with CClF₂CCl₂F, CCl₃CF₃, CClF₂CClF₂, and CCl₂FCF₃

Baasandorj

Feierabend

Burkholder

2011

Int J of Chemical Kinetics

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5 ) at 296 K are reported. Rate coefficients for the loss of O( 1 D) were measured using a competitive reaction technique, with n-butane (n-C 4 H 10 ) as the reference reactant, employing pulsed laser photolysis production of O( 1 D) combined with laser-induced fluorescence detection of the OH radical temporal profile. Rate coefficients were measured to be k 2 = (2.33 ± 0.40) × 10 −10 cm 3 molecule −1 s −1 , k 3 = (2.61 ± 0.40) × 10 −10 cm 3 molecule −1 s −1 , k 4 = (1.42 ± 0.25) × 10 −10 cm 3 molecule −1 s −1 , and k 5 = (1.62 ± 0.30) × 10 −10 cm 3 molecule −1 s −1 . ClO radical product yields for reactions (2)-(5) were measured using pulsed laser photolysis combined with cavity ring-down spectroscopy to be 0.80 ± 0.10, 0.79 ± 0.10, 0.85 ± 0.12, and 0.79 ± 0.10, respectively. The quoted errors in k and Y are at the 2σ (95% confidence) level and include estimated systematic errors. C 2011 Wiley Periodicals, Inc.

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Yield of Formyl Radical from the Vinyl + O₂ Reaction

Matsugi

Miyoshi

2013

Int J of Chemical Kinetics

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The yield of formyl (HCO) radical from the reaction of vinyl (C2H3) radical with O2 has been investigated by using a pulsed laser photolysis/cavity ring‐down spectroscopy technique at room temperature. The rate constants for the C2H3 + O2 and HCO + O2 reactions were measured to be (8.60 ± 0.87) × 10−12 and (5.55 ± 1.00) × 10−12 cm3 molecule−1 s−1, respectively, which were consistent with preceding studies. The yield of HCO radical was determined to be ϕ(HCO) = 0.222 ± 0.066, and it was independent of pressure in the pressure range 10–100 Torr with He or N2 buffer. The Rice–Ramsperger–Kassel–Marcus calculation combined with a prior energy distribution model could reproduce the experimental HCO‐radical yield and indicated that a significant portion of HCO radicals formed in the C2H3 + O2 reaction promptly dissociated to H + CO. The first CO‐stretch excited state of HCO radical, HCO(0,0,1), was observed at the total pressure of 1 Torr; the time profiles of which were satisfactory reproduced by a kinetic simulation including the relaxation of hot HCO radicals. These experimental, theoretical, and modeling results provide solid evidence for the prompt dissociation of hot HCO radicals formed in the C2H3 + O2 reaction. The product‐specific rate constants that extrapolated to higher temperature and wider pressure ranges are presented. Implications of the suggested mechanism for combustion modeling are also discussed.

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Kinetic study of the reaction of the acetyl radical, CH3CO, with O3 using cavity ring-down spectroscopy

Cited by 3 publications

References 22 publications

ClO Radical Yields in the Reaction of O(¹D) with Cl₂, HCl, Chloromethanes, and Chlorofluoromethanes

ClO Radical Yields in the Reaction of O(¹D) with Cl₂, HCl, Chloromethanes, and Chlorofluoromethanes

Rate coefficients and ClO radical yields in the reaction of O(¹D) with CClF₂CCl₂F, CCl₃CF₃, CClF₂CClF₂, and CCl₂FCF₃

Yield of Formyl Radical from the Vinyl + O₂ Reaction

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Kinetic study of the reaction of the acetyl radical, CH3CO, with O3 using cavity ring-down spectroscopy

Cited by 3 publications

References 22 publications

ClO Radical Yields in the Reaction of O(1D) with Cl2, HCl, Chloromethanes, and Chlorofluoromethanes

ClO Radical Yields in the Reaction of O(1D) with Cl2, HCl, Chloromethanes, and Chlorofluoromethanes

Rate coefficients and ClO radical yields in the reaction of O(1D) with CClF2CCl2F, CCl3CF3, CClF2CClF2, and CCl2FCF3

Yield of Formyl Radical from the Vinyl + O2 Reaction

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ClO Radical Yields in the Reaction of O(¹D) with Cl₂, HCl, Chloromethanes, and Chlorofluoromethanes

ClO Radical Yields in the Reaction of O(¹D) with Cl₂, HCl, Chloromethanes, and Chlorofluoromethanes

Rate coefficients and ClO radical yields in the reaction of O(¹D) with CClF₂CCl₂F, CCl₃CF₃, CClF₂CClF₂, and CCl₂FCF₃

Yield of Formyl Radical from the Vinyl + O₂ Reaction