1965
DOI: 10.1021/j100782a036
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Kinetics of the Attack of Molybdenum by Dissociated Chlorine1

Abstract: The true kinetics of the attack of molybdenum surfaces by both atomic and diatomic chlorine have been studied using microwave discharge-fast flow system techniques coupled with electrical resistance heating and monitoring of the reacting specimens. Experimental results are reported herein over the surface temperature range from 400 0 K to 1530 0 K, at reactant partial pressures of the order of 10-to 10-1 Torr. In contrast to the behavior of nickel, dissociation markedly increases the chlorination probability o… Show more

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Cited by 20 publications
(11 citation statements)
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“…In the case of adsorption of chlorine on the metal surface of niobium, tantalum, molybdenum, and tungsten, the adsorption has been described to follow a mechanism, which involves an activated step, while for nickel this whole reaction was shown to be very fast and leads to fully dissociated and chemically adsorbed chlorine atoms as discussed, e.g., by Rosner and Allendorf or McKinley and Shuler . Therefore, the activation energy for the dissociative adsorption on refractory metals is much higher than on nickel .…”
Section: Mathematical Approachmentioning
confidence: 99%
“…In the case of adsorption of chlorine on the metal surface of niobium, tantalum, molybdenum, and tungsten, the adsorption has been described to follow a mechanism, which involves an activated step, while for nickel this whole reaction was shown to be very fast and leads to fully dissociated and chemically adsorbed chlorine atoms as discussed, e.g., by Rosner and Allendorf or McKinley and Shuler . Therefore, the activation energy for the dissociative adsorption on refractory metals is much higher than on nickel .…”
Section: Mathematical Approachmentioning
confidence: 99%
“…They can be described by the mechanisms of heterogeneous catalysis . According to these theories, the chlorination of the refractory metals tungsten, molybdenum, niobium, and tantalum follows most probably a Rideal‐type of mechanism where the surface is first covered with dissociated chlorine atoms and the chlorine layer is subsequently attacked by further chlorine from the surrounding gas phase .…”
Section: Reaction Mechanisms Of the High Temperature Chlorination Of mentioning
confidence: 99%
“…This leads to much lower adsorption of chlorine on the surface. Rosner et al describe this phenomenon by the so‐called “sticking probability” : =adsorbed Climpacting Cl2 …”
Section: Reaction Mechanisms Of the High Temperature Chlorination Of mentioning
confidence: 99%
“…[27]. There are also classical models illustrating the physics [28]. The hamiltonian (4) has many different parametrizations.…”
Section: A General Basicsmentioning
confidence: 99%