2010
DOI: 10.1016/j.polymdegradstab.2010.07.039
|View full text |Cite
|
Sign up to set email alerts
|

Kinetics of the thermal decomposition of processed poly(lactic acid)

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

5
53
0
4

Year Published

2011
2011
2015
2015

Publication Types

Select...
9
1

Relationship

0
10

Authors

Journals

citations
Cited by 74 publications
(62 citation statements)
references
References 26 publications
5
53
0
4
Order By: Relevance
“…451 PLA-OLA films showed a single step degradation process 452 in all cases, with T max values similar to those of the neat 453 polymer, which was 365°C, in agreement with previously 454 reported values [11,31,32]. However, the thermal stability 455 of these materials was reduced by the addition of OLAs.…”
supporting
confidence: 80%
“…451 PLA-OLA films showed a single step degradation process 452 in all cases, with T max values similar to those of the neat 453 polymer, which was 365°C, in agreement with previously 454 reported values [11,31,32]. However, the thermal stability 455 of these materials was reduced by the addition of OLAs.…”
supporting
confidence: 80%
“…On the basis of the micrographs it can be inferred that the presence of the compatibilizers in the ternary blends leads to a finer PE dispersed phase and improves the adhesion between PLA and PE due to reactions between PLA functional end-groups and the GMA groups present in both compatibilizers [13,17] . These reactions may be favored by molecular weight reduction that occurs during processing, thereby increasing the number of PLA end-groups [18,19] . The compatibilizers also have affinity with the polyethylene due to the presence of ethylene blocks in their structures.…”
Section: Resultsmentioning
confidence: 99%
“…Both SiV AM -PLA and CC-PLA showed a peak at 16°, which was assigned to the diffraction peak from the crystalline part of PLA. 16), 17) The SiV AM and SiV AM -PLA particles were estimated to contain 2.0 and 1.6 wt % of silicon, respectively, from the ICP-AES analysis. To achieve insight into the structure of these trace amounts of APTES-derived siloxane, 29 Si CP/MAS-NMR was performed on the particles (Fig.…”
Section: ¹1mentioning
confidence: 99%