“…Additionally, magnetron sputter deposition provides a high level of control over chemical and morphological properties [25]. Several studies have reported bismuth titanate production via magnetron sputter deposition [26]- [28], however these studies are based on the use of compound targets. In contrast to that, sputtering of metallic targets in a reactive oxygen containing atmosphere allows deposition at considerably lower cost (no sophisticated radiofrequency power sources required); enables higher deposition rates and therefore shorter deposition times; and is less prone to arcing / process failures.…”