2022
DOI: 10.1117/1.jatis.8.1.017002
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Laboratory-based reflectometer using line spectra of an RF-induced gas-discharge lamp in 30- to 200-nm wavelength range

Abstract: A laboratory-based reflectometer designed for characterizing the reflectivity of optical coatings in 30-to 200-nm wavelength range was recently developed at IPOE. An RF-produced gas-discharge light source is applied to generate characteristic lines. The light source is mounted on a grazing incident monochromator with a 146-deg deviation angle between the incident and diffracted arms. By precisely adjusting the toroidal grating inside the monochromator chamber, monochromatic lights are acquired through the exit… Show more

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Cited by 6 publications
(4 citation statements)
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References 29 publications
(32 reference statements)
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“…The EUV reflectivity is measured by the EUV reflectometer using line spectra at 46.1 nm generated by a radio frequency induced gas-discharge lamp at IPOE at the incidence angle of 5° [14]. The reflectivity error was less than 2%.…”
Section: Optical Performancementioning
confidence: 99%
“…The EUV reflectivity is measured by the EUV reflectometer using line spectra at 46.1 nm generated by a radio frequency induced gas-discharge lamp at IPOE at the incidence angle of 5° [14]. The reflectivity error was less than 2%.…”
Section: Optical Performancementioning
confidence: 99%
“…Reflectivity, as a function of angle, was measured using a specialized extreme ultraviolet reflectometer [28]. Utilization of this apparatus permitted the quantification of reflectivity within the extreme ultraviolet (EUV) spectral domain spanning 30-200 nm.…”
Section: Measurements and Data Analysismentioning
confidence: 99%
“…The test result on the BESSY-II facility (Sokolov et al 2014) shows that a bandwidth (FWHM) of 3.68 nm is achieved with the peak wavelength at 45.5 nm (Wu et al 2022). The reflectivity of the flight mirror is measured by the EUV reflectometer using line spectra at 46.1 nm generated by a radio frequency induced gas-discharge lamp at Tongji University (Yu et al 2022) at the incidence angle of 5°. The multilayer structure is further optimized to achieve higher reflectivity at 46.1 nm.…”
Section: Optical and Mechanical Structurementioning
confidence: 99%