A reactive high-power impulse magnetron sputtering system (HiPIMS) working in Ar + H 2 S gas mixture was investigated as a source for the deposition of iron sulfide thin films. As a sputtering material, a pure Fe target was used. Plasma parameters in this system were investigated by a time-resolved Langmuir probe, radio-frequency (RF) ion flux probe, quartz crystal monitor modified for measurement of the ionized fraction of depositing particles, and by optical emission spectroscopy. A wide range of mass flow rates of reactive gas H 2 S was used for the investigation of the deposition process. It was found that the deposition rate of iron sulfide thin films is not influenced by the flow rate of H 2 S reactive gas fed into the magnetron discharge although the target is covered by iron sulfide compound. The ionized fraction of depositing particles decreases from r ≈ 40% to r ≈ 20% as the flow rate of H 2 S, Q H 2 S , changes from 0 to 19 sccm at the gas pressure around p ≈ 1 Pa in the reactor chamber. The electron concentration n e measured by the Langmuir probe at the position of the substrate decreases over this change of Q H 2 S from 10 18 down to 10 17 m −3Coatings 2020, 10, 246 2 of 16 realized. Furthermore, FeS films were found to be excellent low-friction materials working like solid state lubricants in tribological applications [16].High-power impulse magnetron sputtering system (HiPIMS) is a relatively novel approach for the deposition of thin films [17][18][19][20]. This method utilizes very high discharge current densities during the pulse j D > 1 A cm −2 , but, simultaneously, average power applied in the HiPIMS discharge is similar to DC magnetron sputtering. These conditions result in a high degree of ionization of sputtered particles. Thus, the deposited films have higher density, better adhesion, and 3D objects such as trenches, etc. and can be more uniformly coated as well [21][22][23]. Recently, reactive HiPIMS in various gas mixtures has been used for the deposition of oxides, nitrides, and other materials [24][25][26][27][28][29][30][31].In this paper, we will present the first study of plasma parameters in the reactive HiPIMS in Ar + H 2 S gas mixture whose results could be further used for the optimization of deposition of iron sulfide thin films or other types of sulfides.
ExperimentalThe experimental setup of the reactive HiPIMS in Ar + H 2 S gas mixture can be seen in Figure 1. The system is equipped with a pure iron Fe target with an outer diameter of 50 mm and a thickness of 0.8 mm. The stainless-steel reactor vacuum chamber is continuously pumped by a combination of turbomolecular (pumping speed S t = 250 L·s −1 ) and rotary vane pumps (pumping speed S r = 25 m 3 h −1 ). The gas flow rates of Ar (99.9999%) and pure H 2 S (99.5%) are independently controlled by two mass flow controllers. It is useful to note that H 2 S is an inflammable and highly toxic gas. Consequently, the use of H 2 S in a laboratory is subject to approval by a respective official body. The pressure in the reactor cham...