Large area and deep sub-wavelength interference lithography employing odd surface plasmon modes

Liu, Liqin; Luo, Yanhong; Zhao, Zeyu; Zhang, Wei; Gao, Guohan; Zeng, Beibei; Wang, Changtao; Luo, Xiangang

doi:10.1038/srep30450

Cited by 19 publications

(6 citation statements)

References 39 publications

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“…[ 110 ] The achievable feature size is about 31 nm at a wavelength of 442 nm, and can be further reduced to 19.5 nm at a wavelength of 363.8 nm. [ 111 ] Quite recently, 32 and 22 nm half‐pitch interference lithography was also realized when the lithography structure was separated from the mask, [ 112 ] so that the mask could be protected and used multiple times. Third, by combining the multilayer hyperbolic metamaterial and metal‐photoresist‐metal configuration, the purities of interference modes are further improved, leading to interference patterns with much better contrast, up to 0.98.…”

Section: Coupled Fields Function For Super‐resolution Imaging and Litmentioning

confidence: 99%

Catenary Functions Meet Electromagnetic Waves: Opportunities and Promises

Luo

Guo

et al. 2020

Advanced Optical Materials

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with the development of nanofabrication, characterization, and numerical modeling techniques, research has focused on optical applications in the subwavelength region, where the characteristic dimension of light-matter interactions is below the operating wavelength. [7,8] It was found that catenary functions have played more important roles in this new realm. [9] First, the coupling of evanescent waves, such as surface plasmon polaritons (SPPs) leads to catenary-shaped intensity distributions, [10,11] which have found practical applications in super-resolution imaging and lithography. [12-15] Second, catenaryshaped subwavelength structures have been proved to be ideal candidates for generating geometric phases, which are widely utilized to construct various functional metasurfaces. [2,16-18] Furthermore, besides the field intensity distribution, the dispersion curves of many capacitive metasurfaces were found to be characterized by the catenary function, [3] which provides a versatile mathematical-physical model to predict the optical and electromagnetic properties of metasurfaces. The application of mathematical functions in classical optical problems is a well-established phenomenon. For instance, in geometric optics governed by Fermat's principle and Snell's law, the surfaces of lenses and mirrors have spherical, parabolic, or aspherical shapes to focus light on a given spot. In laser optics, the characteristics of laser beams are characterized by mathematical functions, such as the Gaussian function, Bessel function, Airy function, and Hermite and Laguerre polynomials. [19-21] In addition, the dispersion curve of an anisotropic material is described by an ellipse. If one of the dielectric tensors were to become negative, the dispersion curve would become hyperbolic. Such materials are therefore called hyperbolic materials. [22,23] Because of the unusual dispersion curve, hyperbolic materials could be used in super-resolution imaging as well as enhancement of spontaneous emission. In this review, we focus on the applications of catenary functions in optics and electromagnetics. There are two types of catenary functions, the hyperbolic cosine function (ordinary catenary) and the logarithmic cosine function, which is often called catenary of equal strength. [1] As shown in Figure 1, both curves resemble the parabolic curve for vanishingly small x values. As x increases, the discrepancy increases and the slope of the catenary of equal strength is the largest among the three curves. Like the parabola, both types of catenary functions Catenary functions play pivotal roles in describing the electromagnetic vectors, intensity distribution, and dispersion of structured light on the subwavelength scale. In this article, the history, basic theories, functional devices, and applications of catenary functions in optics and electromagnetics are reviewed. First, the catenary fields generated by the coupling of evanescent waves are discussed, together with their applications in flat optics, super-resolution imaging, and lith...

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Section: Coupled Fields Function For Super‐resolution Imaging and Litmentioning

confidence: 99%

Catenary Functions Meet Electromagnetic Waves: Opportunities and Promises

Luo

Guo

et al. 2020

Advanced Optical Materials

Self Cite

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“…Under some special conditions, it has been developed to SPP lithography, which could be possibly generalized for wider applications. For example, Xiangang Luo et al built an SPP lithograph system to realize sub-22-nm half-pitch lithography, providing a viable alternative to traditional costly and complex optical lithography systems [204,205] . Moreover, the innovative concept also illuminates possible applications in other fields, such as photonic chips with signal transmission in subwavelength scales [61] and new platforms revealing novel physics such as photonics Weyl media [63] .…”

Section: Application Scenariosmentioning

confidence: 99%

Revolutionary meta-imaging: from superlens to metalens

Chen

Xiao

et al. 2023

Photonics Insights

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The refractive-lens technique has been well developed over a long period of evolution, offering powerful imaging functionalities, such as microscopes, telescopes, and spectroscopes. Nevertheless, the ever-growing requirements continue to urge further enhanced imaging capabilities and upgraded devices that are more compact for convenience. Metamaterial as a fascinating concept has inspired unprecedented new explorations in physics, material science, and optics, not only in fundamental researches but also novel applications. Along with the imaging topic, this paper reviews the progress of the flat lens as an important branch of metamaterials, covering the early superlens with super-diffraction capability and current hot topics of metalenses including a paralleled strategy of multilevel diffractive lenses. Numerous efforts and approaches have been dedicated to areas ranging from the new fascinating physics to feasible applications. This review provides a clear picture of the flat-lens evolution from the perspective of metamaterial design, elucidating the relation and comparison between a superlens and metalens, and addressing derivative designs. Finally, application scenarios that favor the ultrathin lens technique are emphasized with respect to possible revolutionary imaging devices, followed by conclusive remarks and prospects.

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“…Surface plasmons [13,14] are widely used in many fields because of their advantages of field enhancement and large wave vectors. Surface plasmon interference lithography [15][16][17][18] based on a prism or specially designed mask coupling facilitates the fabrication of subwavelength structures that break through the diffraction limit. Many research results on surface plasmon interference lithography have confirmed the high resolution of the subwavelength structure fabricated by this lithography technology; however, its aspect ratio is low [19].…”

Section: Introductionmentioning

confidence: 99%

Theoretical simulated fabrication of nanostructure by interference of four-beam guided mode excited by 193 nm laser

Di,

Yao,

Wang

et al. 2023

Phys. Scr.

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This study proposed a lithography method for fabricating periodic nanostructures using the interference of four-beam TE0 guided modes excited by a 193 nm deep ultraviolet laser. The physical mechanism and normalized electric field intensity distribution of four-beam TE0 guided mode interference were theoretically analyzed and numerically simulated using the finite element method. The simulation results confirmed the ability of this method to fabricate periodic structures with a half-pitch resolution of 30.35 nm (approximately λ/6.36), an aspect ratio of 3.95, and a contrast ratio of 1. The theoretically calculated value of the resolution was consistent with the numerical simulation value. The resolution and aspect ratio of the fabricated nanostructures could be adjusted through changes to the thickness of the resist. Moreover, the shape of the fabricated nanostructures, such as the one-dimensional sub-wavelength grating structure and two-dimensional square array lattice structure, were adjustable via changes to the number and azimuth of the excited TE0 guided modes. The results obtained in this study provide valuable theoretical information for the practical manufacture of ultra-high-resolution lithography.

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Large area and deep sub-wavelength interference lithography employing odd surface plasmon modes

Cited by 19 publications

References 39 publications

Catenary Functions Meet Electromagnetic Waves: Opportunities and Promises

Catenary Functions Meet Electromagnetic Waves: Opportunities and Promises

Revolutionary meta-imaging: from superlens to metalens

Theoretical simulated fabrication of nanostructure by interference of four-beam guided mode excited by 193 nm laser

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