Large-area Co-silicide nanodot arrays produced by colloidal nanosphere lithography and thermal annealing

Cheng, Sheng-Tzong; Wong, S.L.; Lu, Shigang; Chen, H.

doi:10.1016/j.ultramic.2008.04.065

Cited by 4 publications

(1 citation statement)

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“…To overcome these limitations, an alternative high-throughput, cost-effective nanopatterning scheme known as colloidal nanosphere lithography (NSL) has recently been proposed. [11][12][13] Although the colloidal NSL technique has been utilized to fabricate various periodic metal nanodots and nanowires or nanotubes on Si under different heating conditions, [14][15][16][17] the formation of 2D periodic metal silicide nanodots on Si(111) substrates using this technique has not yet been demonstrated. Therefore, it is of both fundamental and scientific interests to investigate further the reaction mechanisms and structure evolutions of nickel silicide dots on Si(111), taking advantage of the colloidal NSL technique to define the size-controllable, periodic nickel nanodot arrays.…”

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confidence: 99%

Formation and Characterization of Periodic Arrays of Nickel Silicide Nanodots on Si(111) Substrates

Cheng

Wang

Chen

2009

jjap

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We report here the first study on the formation of two-dimensional (2D) periodic arrays of nickel metal and Ni-silicide nanodots on Si(111) substrates by the colloidal nanosphere lithography (NSL) and thermal annealing techniques. For the Ni metal nanodot array on Si(111) sample after annealing, NiSi 2 appears to form as the first silicide phase at a temperature as low as 250 C. From transmission electron microscopy (TEM) and electron diffraction analyses, the NiSi 2 nanodots were found to grow epitaxially on the Si (111) surface with the crystallographic relationships NiSi 2 [111] k Si[111] and NiSi 2 ð22 20Þ k Sið2 2 20Þ. In the higher temperatures annealed samples, many of the epitaxial NiSi 2 nanodots were observed to have truncated shapes, and the formation of the faceted structures became more pronounced as the annealing temperature increased. The observed results demonstrate that using the colloidal NSL and heat treatment approaches, it is expected that the investigations of the interfacial reactions of various metal nanodot arrays on Si-based substrates can be achieved.

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