2013
DOI: 10.1364/josab.30.002584
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Large-area omnidirectional antireflection coating on low-index materials

Abstract: Large-area subwavelength dielectric hexagonal lattices of cylindrical pillars on quartz substrates that provide high optical transmittance at all angles of incidence under different polarizations of light, and are fabricated using lowcost patterning techniques, are demonstrated and analyzed. Transmittance >85% for angles of incidence in excess of 70°is demonstrated at visible and near-infrared wavelengths, and the structures employed are shown to be superior at visible wavelengths to tapered "moth eye" surface… Show more

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Cited by 10 publications
(6 citation statements)
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“…In these cases, the planar PET sheet shows slightly lower transmittance compared to moth‐eye textured PET sheets at incident angles < 60°, and slightly higher transmittance at incident angles > 60°. In principle, an optimal graded‐refractive index structure will yield the best performance ; however, the optimal structures often require large ratios of height to diameter to assure a sufficiently smooth, gradual change in refractive index, which is extremely challenging in terms of fabrication. We therefore compare the transmittance characteristics of these moth‐eye structures within a physically attainable range of heights.…”
Section: Resultsmentioning
confidence: 99%
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“…In these cases, the planar PET sheet shows slightly lower transmittance compared to moth‐eye textured PET sheets at incident angles < 60°, and slightly higher transmittance at incident angles > 60°. In principle, an optimal graded‐refractive index structure will yield the best performance ; however, the optimal structures often require large ratios of height to diameter to assure a sufficiently smooth, gradual change in refractive index, which is extremely challenging in terms of fabrication. We therefore compare the transmittance characteristics of these moth‐eye structures within a physically attainable range of heights.…”
Section: Resultsmentioning
confidence: 99%
“…Although these structures can exhibit good broadband and omnidirectional antireflection performance, surface and near‐surface material defects are typically introduced in etching processes, potentially resulting in reduced carrier collection efficiency, and in most cases an additional passivation layer is required to reduce photo‐generated carrier recombination at these defects. On the other hand, subwavelength nanostructures on materials with low refractive indices are of great interest because of their wide usage as packaging materials in photovoltaic or display applications . However, the fabrication of subwavelength nanostructures with sufficiently high aspect ratios and mechanical stability on materials with low refractive indices is still challenging.…”
Section: Introductionmentioning
confidence: 99%
“…In many applications such as solar cells and photodetectors, such a reflection is detrimental to the system performance and thus an effective antireflection strategy is required. A standard approach includes single-or multi-layer interference [1][2][3][4][5][6], and adiabatic optical impedance matching [7][8][9][10][11][12][13][14][15][16][17], frequently at the nanoscale [18][19][20][21][22][23][24][25][26][27][28].…”
Section: Introductionmentioning
confidence: 99%
“…In many applications, for example, solar cells and photodetectors, such a reflection is detrimental to system performance and thus an effective antireflection strategy is required. A standard approach includes single-or multi-layer interference [1][2][3][4][5][6], and adiabatic optical impedance matching [7][8][9][10][11][12][13][14][15][16], frequently at the nanoscale [17][18][19][20][21][22][23].…”
Section: Introductionmentioning
confidence: 99%