2014
DOI: 10.1364/ome.4.000944
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Large area plasmonic nanoparticle arrays with well-defined size and shape

Abstract: We demonstrate an innovative process to fabricate uniformly shaped plasmonic nanoparticles. Laser interference lithography, nano-imprint lithography and a lift-off process are employed for the controlled production of periodically arranged nanoparticles on large areas. Round and elliptic silver particles with diameters of about 200 nm on an area of 5×5cm2 are investigated. Measurements of resonant absorption by the metal particles are in agreement with data computer-simulated by rigorous coupled wave analysis.… Show more

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Cited by 11 publications
(10 citation statements)
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“…al. [39]. An increased surface recombination velocity is expected at the grating interface due to the increased surface area and possible material damage due to etching processes.…”
Section: Outlook -Fabrication Routes To Proposed Solar-cell Designmentioning
confidence: 99%
“…al. [39]. An increased surface recombination velocity is expected at the grating interface due to the increased surface area and possible material damage due to etching processes.…”
Section: Outlook -Fabrication Routes To Proposed Solar-cell Designmentioning
confidence: 99%
“…Details of the complete nanofabrication process chain including the lift-off process can be found in Ref. [21].The nanoparticles had an array period of 300 nm, a diameter of 150 nm and a height of 15 nm. The NPs were separated from the semiconductor by a 15 nm thick TaO x spacer layer.…”
Section: A Prototype Fabricationmentioning
confidence: 99%
“…The method for the manufacture of nanoparticle arrays is described in detail in [10] and shall be reviewed here. (2).…”
Section: Manufacture Of Defined Silver Nanoparticle Arraysmentioning
confidence: 99%
“…The parasitic absorption can be minimized by realising regularly ordered particles. Our fabrication process, suitable to meet these requirements, is based on interference lithography (IL), UV-nanoimprint lithography (UV-NIL) and lift-off [10].…”
Section: Introductionmentioning
confidence: 99%