Large-area soft x-ray projection lithography using multilayer mirrors structured by RIE

Kloidt, A.; Kleineberg, Ulf; Schmiedeskamp, B.; Kadel, Klaus; Schomburg, Werner Karl; Hormes, F. J.; Heinzmann, Ulrich

doi:10.1117/12.140591

Cited by 5 publications

(3 citation statements)

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“…Multilayer mirrors for the soft x-ray and extreme ultraviolet ranges consisting of two materials with high and low optical constants are studied since a long time. The potential applications include telescope [1], projection lithography [2,3], synchrotron beamline [4] and x-ray microprobe [5]. Bi-layer multilayers have been studied for many years and some of them have achieved high optical performance and good thermal stability.…”

Section: Introductionmentioning

confidence: 99%

Optical and structural characterization of the Co/Mo 2 C/Y system

Yuan

Guen

André

et al. 2014

Applied Surface Science

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We study the thermal behaviour of a tri-layer multilayer, designed by inserting a third material, yttrium, into the previously studied Co/Mo 2 C system. The system is designed to work at near-normal incidence at the wavelength of 14.1 nm. The theoretical reflectivity of Co-based multilayer (Co/Mo 2 C/Y system) is improved up to 54% after the addition of yttrium. Two types of multilayers with different orders of yttrium layer are deposited: Co/Mo 2 C/Y and Co/Y/Mo 2 C. The samples are annealed up to 600°C. The multilayers were characterized using hard x-ray and extreme ultraviolet reflectivity, nuclear magnetic resonance (NMR) spectroscopy and x-ray diffraction (XRD). The results show that the reflectivity of the Co/Mo 2 C/Y multilayer is 27.5% at near normal incidence around 14.6 nm for as-deposited sample, and then it decreases gradually after annealing up to 600°C. A significant period compression is observed from 300°C annealing and above. The Co/Y/Mo 2 C multilayer shows low reflectivity, less than 2.5%. NMR spectra reveal that the pure Co layers are completely mixed with other elements since there is no signal from ferromagnetic Co in the annealing samples of the Co/Mo 2 C/Y multilayer and all Co/Y/Mo 2 C samples. Based on the NMR and XRD results, we fit the EUV data for both multilayers with two different models in one period taking into account the formation of the interfacial compounds.

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Section: Introductionmentioning

confidence: 99%

Optical and structural characterization of the Co/Mo 2 C/Y system

Yuan

Guen

André

et al. 2014

Applied Surface Science

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“…Previously, for the manufacture of microdevices using EUV lithography (λ ∼ 12.4 nm), flat reflective masks were manufactured and tested [16] basing on a Mo/Si EUV multilayer mirror (d ∼ 7.5 nm, R ∼ 54%). They were structured using reactive ion etching.…”

Section: Introductionmentioning

confidence: 99%

“…We take the advantages of both schemes: a multilayer mask with high integral reflectivity similar to [16] and shortwavelength x-rays (λ < 0.4 nm) to reduce the influence of diffraction effects and obtain image element sizes as close to 1 µm as possible. Therefore, in this paper, we propose a new design of masks based on multilayer mirrors, in which many disadvantages of conventional masks are eliminated or significantly weakened.…”

Section: Introductionmentioning

confidence: 99%

Reflective x-ray masks for x-ray lithography

Chumak,

Peredkov,

Devizenko

et al. 2024

J. Micromech. Microeng.

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Application of X-ray multilayers as reflective X-ray masks (RXMs) for X-ray lithography is proposed. The mask is a specially prepared multilayer mirror capable to selectively reflect X-rays. The use of grazing geometry allows a pattern design on the mask to be compressed in one direction. Application examples are given for the masks (WC/Si multilayers) with two types of a radiation source: an X-ray tube (λ=0.154 nm) and a synchrotron (λ~0.35 nm). The compression of the mask segments by 14-30 times with the imprint size in the resist plane 3.5-4 μm is obtained. The advantages of the proposed masks are given. The possibilities of obtaining submicron imprints are discussed.

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